Tunable periodic graphene antidot lattices fabricated by e-beam lithography and oxygen ion etching
文献类型：期刊论文
| 作者 | Liu, LZ ; Tian, SB ; Long, YZ ; Li, WX ; Yang, HF ; Li, JJ ; Gu, CZ |
| 刊名 | VACUUM
 |
| 出版日期 | 2014 |
| 卷号 | 105页码:21 |
| 关键词 | Patterning graphene Antidot lattices EBL RIE |
| ISSN号 | 0042-207X |
| 通讯作者 | Li, JJ (reprint author), Chinese Acad Sci, Beijing Natl Lab Condensed Matter Phys, Inst Phys, Beijing 100190, Peoples R China. |
| 中文摘要 | Intrinsic monolayer graphene has no band gap between its conduction and valence bands, which limits its application in many aspects as a semiconductor. Antidot lattices by constructing periodic holes on graphene have been proved to be an intriguing strategy to introduce a band gap into graphene. Here we used the e-beam lithography (EBL) combined with the oxygen reactive ion etching (RIE) to fabricate tunable antidot lattices with different and uniform regularly spaced holes on graphene. In this way, tunable periodic graphene nanostructures with the dimensions ranging from similar to 20 nm to several hundreds of nanometers can be fabricated by controlling exposure dose and etching time. (C) 2014 Elsevier Ltd. All rights reserved. |
| 资助信息 | NSFC [11174362, 91023041, 51272278, 61390503, 91323304]; Knowledge Innovation Project of CAS [KJCX2-EW-W02] |
| 语种 | 英语 |
| 公开日期 | 2015-04-14 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/59764]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | Liu, LZ,Tian, SB,Long, YZ,et al. Tunable periodic graphene antidot lattices fabricated by e-beam lithography and oxygen ion etching[J]. VACUUM,2014,105:21. |
| APA | Liu, LZ.,Tian, SB.,Long, YZ.,Li, WX.,Yang, HF.,...&Gu, CZ.(2014).Tunable periodic graphene antidot lattices fabricated by e-beam lithography and oxygen ion etching.VACUUM,105,21. |
| MLA | Liu, LZ,et al."Tunable periodic graphene antidot lattices fabricated by e-beam lithography and oxygen ion etching".VACUUM 105(2014):21. |
入库方式： OAI收割
来源：物理研究所
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