The size effects of inclusions on laser induced film damage
文献类型：期刊论文
| 作者 | Han, Jinghua1; Li, Yaguo2; Fan, Weixing1; He, Changtao3 ; Wang, Pingqiu4; Niu, Ruihua4; Feng, Guoying1; Liu, Quanxi4
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| 刊名 | JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS
 |
| 出版日期 | 2013-09-01 |
| 卷号 | 15期号:9-10页码:943-947 |
| 关键词 | Laser-induced damage Inclusion Thermal effect Scattering Laser plasma |
| 英文摘要 | The damage of thin films due to inclusions can be caused by thermal accumulation, interference of scattered light with the incident laser beam and laser induced plasma. The synergic effects of these three mechanisms determine the damage characteristics of optical thin films, each of which is related to the size of inclusions in thin films. Our research results show that the films are damaged owing to the localized interference of light and the melting of thin films when the radii of inclusion particles lie within 24 nm and 40 nm. The laser-induced plasma resulting from the evaporation and ionization of thin film material will be generated when the radii of inclusion particles are larger than 40 nm. Those smaller than 24 nm, can be regarded as safe and free from inducing damage. |
| WOS标题词 | Science & Technology ; Technology ; Physical Sciences |
| 类目[WOS] | Materials Science, Multidisciplinary ; Optics ; Physics, Applied |
| 研究领域[WOS] | Materials Science ; Optics ; Physics |
| 关键词[WOS] | CONTAMINATION PARTICLES ; MULTILAYER COATINGS ; FUSED-SILICA ; THIN-FILMS ; SURFACE ; THRESHOLD ; ABLATION ; DEFECTS ; PULSES ; NM |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000326414700004 |
| 源URL | [http://ir.xao.ac.cn/handle/45760611-7/489]  |
| 专题 | 新疆天文台_计算机技术室 |
| 作者单位 | 1.Sichuan Univ, Sch Elect & Informat Engn, Chengdu 610064, Peoples R China 2.Fine Opt Engn Res Ctr, Chengdu 610041, Peoples R China 3.Chinese Acad Sci, XinJiang Astron Observ, Urumqi 830011, Peoples R China 4.Southwest Inst Tech Phys, Chengdu 610041, Peoples R China |
| 推荐引用方式 GB/T 7714 | Han, Jinghua,Li, Yaguo,Fan, Weixing,et al. The size effects of inclusions on laser induced film damage[J]. JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS,2013,15(9-10):943-947. |
| APA | Han, Jinghua.,Li, Yaguo.,Fan, Weixing.,He, Changtao.,Wang, Pingqiu.,...&Liu, Quanxi.(2013).The size effects of inclusions on laser induced film damage.JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS,15(9-10),943-947. |
| MLA | Han, Jinghua,et al."The size effects of inclusions on laser induced film damage".JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS 15.9-10(2013):943-947. |
入库方式： OAI收割
来源：新疆天文台
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