Moisture-resistant protective films for UV-light filter based on diisocyanate-bridged polysilsesquioxanes
文献类型：期刊论文
| 作者 | Hu, Shengwei1,2; Xu, Yao1; Jiang, Dong1,2; Wu, Dong1; Sun, Yuhan1; Deng, Feng3 |
| 刊名 | THIN SOLID FILMS
 |
| 出版日期 | 2009-11-02 |
| 卷号 | 518期号:1页码:348-354 |
| 关键词 | Moisture-resistance UV-light filter Polysilsesquioxane Diisocyanate |
| 通讯作者 | Xu, Y (reprint author), Chinese Acad Sci, Inst Coal Chem, State Key Lab Coal Convers, Taiyuan 030001, Peoples R China. |
| 英文摘要 | Three bridged silsesquioxanes were synthesized via the reactions between 3-aminopropyltriethoxysilane and three different diisocyanates, i.e., m-xylylene diisocyanate, 1, 6-diisocyanatohexane, and isophorone diiocyanate. The subsequent bridged polysilsesquioxane sols were prepared by the room-temperatured polycondensation of these bridged silsesquioxane using basic catalysis. Transparent films with a thickness of around 330 nm were obtained by dip-coating the bridged polysilsesquioxane sols on the nickel sulfate hexahydrate (NiSO(4)center dot 6H(2)O, NSH) crystal wafers that are commercially used as ultraviolet light filter working at a wavelength of 300 nm The N(2) adsorption/desorption experimental results showed that the films were all nonporous with pore volume less than 2 x 10(-3) cm(3) g(-1). The obtained three polysilsesquioxanes all exhibited very high condensation degree of siloxane (above 99%). These films showed high optical transmittance at desired wavelengths (280-320 nm) and excellent moisture-resistant protection to the NSH filters. (C) 2009 Elsevier B.V. All rights reserved. |
| WOS标题词 | Science & Technology ; Technology ; Physical Sciences |
| 类目[WOS] | Materials Science, Multidisciplinary ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter |
| 研究领域[WOS] | Materials Science ; Physics |
| 关键词[WOS] | ORGANIC-INORGANIC MATERIALS ; NICKEL SULFATE HEXAHYDRATE ; HYBRID MATERIALS ; CRYSTAL ; PRECURSORS ; GROWTH |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000270628800060 |
| 源URL | [http://ir.wipm.ac.cn/handle/112942/2156]  |
| 专题 | 武汉物理与数学研究所_2011年以前论文发表（包括2011年） |
| 作者单位 | 1.Chinese Acad Sci, Inst Coal Chem, State Key Lab Coal Convers, Taiyuan 030001, Peoples R China 2.Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China 3.Chinese Acad Sci, State Key Lab Magnet Resonance & Atom & Mol Phys, Inst Phys & Math, Wuhan 430071, Peoples R China |
| 推荐引用方式 GB/T 7714 | Hu, Shengwei,Xu, Yao,Jiang, Dong,et al. Moisture-resistant protective films for UV-light filter based on diisocyanate-bridged polysilsesquioxanes[J]. THIN SOLID FILMS,2009,518(1):348-354. |
| APA | Hu, Shengwei,Xu, Yao,Jiang, Dong,Wu, Dong,Sun, Yuhan,&Deng, Feng.(2009).Moisture-resistant protective films for UV-light filter based on diisocyanate-bridged polysilsesquioxanes.THIN SOLID FILMS,518(1),348-354. |
| MLA | Hu, Shengwei,et al."Moisture-resistant protective films for UV-light filter based on diisocyanate-bridged polysilsesquioxanes".THIN SOLID FILMS 518.1(2009):348-354. |
入库方式： OAI收割
来源：武汉物理与数学研究所
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