中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Novel displacement in transmission through a two-dimensional semiconductor barrier

文献类型:期刊论文

作者Chen, X; Li, CF; Ban, Y
刊名physics letters a
出版日期2006-05-22
卷号354期号:1-2页码:161-165
关键词lateral displacement ballistic electron beam resonance enhancement
英文摘要the lateral displacement of electron beams transmitting through a two-dimensional semiconductor barrier is quite different from the prediction from snell's law for electron waves. it is shown that the displacement can be greatly enhanced by transmission resonance when the incidence angle is less than but close to the critical angle for total reflection. the displacement depends not only on the barrier's thickness but also on the incidence angle and the incidence energy. the influence of electron's effective mass is also discussed. theoretical results of the stationary-phase approach are confirmed by numerical simulations for a gaussian-shaped incident beam. these phenomena may lead to novel applications in quantum electronic devices. (c) 2006 elsevier b.v. all rights reserved.
WOS标题词science & technology ; physical sciences
类目[WOS]physics, multidisciplinary
研究领域[WOS]physics
关键词[WOS]electron-wave-optics ; tunneling time ; heterostructure ; guides ; interference
收录类别SCI
语种英语
WOS记录号WOS:000237686500025
公开日期2015-08-25
源URL[http://ir.opt.ac.cn/handle/181661/25174]  
专题西安光学精密机械研究所_瞬态光学技术国家重点实验室
作者单位1.Shanghai Univ, Dept Phys, Shanghai 200444, Peoples R China
2.Acad Sinica, Xian Inst Opt & Precis Mech, State Key Lab Transient Opt Technol, Xian 710068, Peoples R China
推荐引用方式
GB/T 7714
Chen, X,Li, CF,Ban, Y. Novel displacement in transmission through a two-dimensional semiconductor barrier[J]. physics letters a,2006,354(1-2):161-165.
APA Chen, X,Li, CF,&Ban, Y.(2006).Novel displacement in transmission through a two-dimensional semiconductor barrier.physics letters a,354(1-2),161-165.
MLA Chen, X,et al."Novel displacement in transmission through a two-dimensional semiconductor barrier".physics letters a 354.1-2(2006):161-165.

入库方式: OAI收割

来源:西安光学精密机械研究所

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