The ultrafast excitation processes in femtosecond laser-induced damage in dielectric omnidirectional reflectors
文献类型：期刊论文
| 作者 | Jia T. Q. ; Sun H. Y. ; Li X. X. ; Feng D. H. ; Li C. B. ; Xu S. Z. ; Li R. X. ; Xu Z. Z. ; Kuroda H. |
| 刊名 | j. appl. phys.
 |
| 出版日期 | 2006 |
| 卷号 | 100期号:2页码:23103 |
| 关键词 | TRANSPARENT MATERIALS ELECTRON DYNAMICS OPTICAL-BREAKDOWN CONDUCTION-BAND PULSE DURATION CAF2 CRYSTALS FUSED-SILICA ABLATION TIME NANOSECOND |
| ISSN号 | 0021-8979 |
| 中文摘要 | a pump and probe system is developed, where the probe pulse duration tau is less than 60 fs while the pump pulse is stretched up to 150-670 fs. the time-resolved excitation processes and damage mechanisms in the omnidirectional reflectors sio2/tio2 and zns/mgf2 are studied. it is found that as the pump pulse energy is higher than the threshold value, the reflectivity of the probe pulse decreases rapidly during the former half, rather than around the peak of the pump pulse. a coupled dynamic model based on the avalanche ionization (ai) theory is used to study the excitation processes in the sample and its inverse influences on the pump pulse. the results indicate that as pulse duration is longer than 150 fs, photoionization (pi) and ai both play important roles in the generation of conduction band electrons (cbes); the cbe density generated via ai is higher than that via pi by a factor of 10(2)-10(4). the theory explains well the experimental results about the ultrafast excitation processes and the threshold fluences. (c) 2006 american institute of physics. |
| 收录类别 | EI |
| 语种 | 英语 |
| WOS记录号 | WOS:000239423400003 |
| 公开日期 | 2009-09-18 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/764]  |
| 专题 | 上海光学精密机械研究所_强场激光物理国家重点实验室 |
| 推荐引用方式 GB/T 7714 | Jia T. Q.,Sun H. Y.,Li X. X.,et al. The ultrafast excitation processes in femtosecond laser-induced damage in dielectric omnidirectional reflectors[J]. j. appl. phys.,2006,100(2):23103. |
| APA | Jia T. Q..,Sun H. Y..,Li X. X..,Feng D. H..,Li C. B..,...&Kuroda H..(2006).The ultrafast excitation processes in femtosecond laser-induced damage in dielectric omnidirectional reflectors.j. appl. phys.,100(2),23103. |
| MLA | Jia T. Q.,et al."The ultrafast excitation processes in femtosecond laser-induced damage in dielectric omnidirectional reflectors".j. appl. phys. 100.2(2006):23103. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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