A large deflection and high payload flexure-based parallel manipulator for UV nanoimprint lithography: Part I. Modeling and analyses
文献类型：期刊论文
| 作者 | Teo, Tat Joo ; Yang, Guilin ; Chen, I-Ming |
| 刊名 | PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY
 |
| 出版日期 | 2014 |
| 卷号 | 38期号:4页码:861 |
| 中文摘要 | This paper presents a flexure-based parallel manipulator (FPM) that delivers nanometric co-planar alignment and direct-force imprinting capabilities to automate an ultra-violet nanoimprint lithography (UV-NIL) process. The FPM is articulated from a novel 3-legged prismatic-prismatic-spherical (3PPS) parallel-kinematic configuration to deliver a theta(x)-theta(y)-Z motion. The developed FPM achieves a positioning and orientation resolution of +/-10 nm and 0.05" respectively, and a continuous output force of 150 N/Amp throughout a large workspace of 5 degrees x5 degrees x 5 degrees mm. Part I mainly focuses on a new theoretical model that is used to analyze the stiffness characteristics of the compliant joint modules that formed the FPM, and experimental evaluations of each compliant joint module. Part II presents the stiffness modeling of the FPM, the performance evaluations of the developed prototype, and the preliminary results of the UV-NIL process. (C) 2014 Elsevier Inc. All rights reserved. |
| 公开日期 | 2015-09-20 |
| 源URL | [http://ir.nimte.ac.cn/handle/174433/11741]  |
| 专题 | 宁波材料技术与工程研究所_2014专题 |
| 推荐引用方式 GB/T 7714 | Teo, Tat Joo,Yang, Guilin,Chen, I-Ming. A large deflection and high payload flexure-based parallel manipulator for UV nanoimprint lithography: Part I. Modeling and analyses[J]. PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY,2014,38(4):861. |
| APA | Teo, Tat Joo,Yang, Guilin,&Chen, I-Ming.(2014).A large deflection and high payload flexure-based parallel manipulator for UV nanoimprint lithography: Part I. Modeling and analyses.PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY,38(4),861. |
| MLA | Teo, Tat Joo,et al."A large deflection and high payload flexure-based parallel manipulator for UV nanoimprint lithography: Part I. Modeling and analyses".PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY 38.4(2014):861. |
入库方式： OAI收割
来源：宁波材料技术与工程研究所
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