Controlled Evaporative Self-Assembly of Poly(acrylic acid) in a Confined Geometry for Fabricating Patterned Polymer Brushes
文献类型：期刊论文
| 作者 | Men, Yonghong ; Xiao, Peng ; Chen, Jing ; Fu, Jun ; Huang, Youju ; Zhang, Jiawei ; Xie, Zhengchao ; Wang, Wenqin ; Chen, Tao |
| 刊名 | LANGMUIR
 |
| 出版日期 | 2014 |
| 卷号 | 30期号:16页码:4863 |
| 中文摘要 | A simple yet robust approach was exploited to fabricate large-scaled patterned polymer brushes by combining controlled evaporative self-assembly (CESA) in a confined geometry and self-initiated photografting and photopolymerization (SIPGP). Our method was carried out without any sophisticated instruments, free of lithography, overcoming current difficulties in fabricating polymer patterns by using complex instruments. |
| 公开日期 | 2015-09-20 |
| 源URL | [http://ir.nimte.ac.cn/handle/174433/11877]  |
| 专题 | 宁波材料技术与工程研究所_2014专题 |
| 推荐引用方式 GB/T 7714 | Men, Yonghong,Xiao, Peng,Chen, Jing,et al. Controlled Evaporative Self-Assembly of Poly(acrylic acid) in a Confined Geometry for Fabricating Patterned Polymer Brushes[J]. LANGMUIR,2014,30(16):4863. |
| APA | Men, Yonghong.,Xiao, Peng.,Chen, Jing.,Fu, Jun.,Huang, Youju.,...&Chen, Tao.(2014).Controlled Evaporative Self-Assembly of Poly(acrylic acid) in a Confined Geometry for Fabricating Patterned Polymer Brushes.LANGMUIR,30(16),4863. |
| MLA | Men, Yonghong,et al."Controlled Evaporative Self-Assembly of Poly(acrylic acid) in a Confined Geometry for Fabricating Patterned Polymer Brushes".LANGMUIR 30.16(2014):4863. |
入库方式： OAI收割
来源：宁波材料技术与工程研究所
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