Thermally Stable Transparent Resistive Random Access Memory based on All-Oxide Heterostructures
文献类型:期刊论文
作者 | Shang, Jie ; Liu, Gang ; Yang, Huali ; Zhu, Xiaojian ; Chen, Xinxin ; Tan, Hongwei ; Hu, Benlin ; Pan, Liang ; Xue, Wuhong ; Li, Run-Wei |
刊名 | ADVANCED FUNCTIONAL MATERIALS
![]() |
出版日期 | 2014 |
卷号 | 24期号:15页码:2171 |
中文摘要 | An all-oxide transparent resistive random access memory (T-RRAM) device based on hafnium oxide (HfOx) storage layer and indium-tin oxide (ITO) electrodes is fabricated in this work. The memory device demonstrates not only good optical transmittance but also a forming-free bipolar resistive switching behavior with room-temperature R-OFF/R-ON ratio of 45, excellent endurance of approximate to 5 x 10(7) cycles and long retention time over 10(6) s. More importantly, the HfOx based RRAM carries great ability of anti-thermal shock over a wide temperature range of 10 K to 490 K, and the high R-OFF/R-ON ratio of approximate to 40 can be well maintained under extreme working conditions. The field-induced electrochemical formation and rupture of the robust metal-rich conductive filaments in the mixed-structure hafnium oxide film are found to be responsible for the excellent resistance switching of the T-RRAM devices. The present all-oxide devices are of great potential for future thermally stable transparent electronic applications. |
公开日期 | 2015-09-20 |
源URL | [http://ir.nimte.ac.cn/handle/174433/11886] ![]() |
专题 | 宁波材料技术与工程研究所_2014专题 |
推荐引用方式 GB/T 7714 | Shang, Jie,Liu, Gang,Yang, Huali,et al. Thermally Stable Transparent Resistive Random Access Memory based on All-Oxide Heterostructures[J]. ADVANCED FUNCTIONAL MATERIALS,2014,24(15):2171. |
APA | Shang, Jie.,Liu, Gang.,Yang, Huali.,Zhu, Xiaojian.,Chen, Xinxin.,...&Li, Run-Wei.(2014).Thermally Stable Transparent Resistive Random Access Memory based on All-Oxide Heterostructures.ADVANCED FUNCTIONAL MATERIALS,24(15),2171. |
MLA | Shang, Jie,et al."Thermally Stable Transparent Resistive Random Access Memory based on All-Oxide Heterostructures".ADVANCED FUNCTIONAL MATERIALS 24.15(2014):2171. |
入库方式: OAI收割
来源:宁波材料技术与工程研究所
浏览0
下载0
收藏0
其他版本
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。