Patterning of graphene microscale structures using electrohydrodynamic atomisation deposition of photoresist moulds
文献类型:期刊论文
作者 | Wang, Dazhi ; Ma, Qian ; Liang, Junsheng ; Xue, Fanghong ; Chen, Li ; Wang, Xiaodong ; Zhou, Xufeng ; Liu, Zhaoping |
刊名 | MICRO & NANO LETTERS
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出版日期 | 2014 |
卷号 | 9期号:2页码:136 |
中文摘要 | In this reported work, a graphene suspension was atomised and deposited using the electrohydrodynamic atomisation technique, enabling the formation of a wide range of graphene thin films. The influences of the atomisation-substrate distance on the characteristics of the graphene films and their sheet resistances were analysed. A distance of 3 mm was found to be the optimum deposition distance for this graphene suspension to produce an even film and a low sheet resistance. At a lower and a higher working distance the graphene films exhibited a sharp-angled heave surface behaviour and a high sheet resistance. In addition, electrohydrodynamic atomisation combined with a photolithography polymeric micromoulding technique was used to form graphene structures. After removing the photoresist micromould, the graphene structures remained under well-arranged characteristics. After two layers of electrohydrodynamic atomisation deposition at a working distance of 3 mm, the thickness of the film was approximate to 400 nm and exhibited a sheet resistance of 127.5 sq(-1) (ohms per square). |
公开日期 | 2015-09-20 |
源URL | [http://ir.nimte.ac.cn/handle/174433/11941] ![]() |
专题 | 宁波材料技术与工程研究所_2014专题 |
推荐引用方式 GB/T 7714 | Wang, Dazhi,Ma, Qian,Liang, Junsheng,et al. Patterning of graphene microscale structures using electrohydrodynamic atomisation deposition of photoresist moulds[J]. MICRO & NANO LETTERS,2014,9(2):136. |
APA | Wang, Dazhi.,Ma, Qian.,Liang, Junsheng.,Xue, Fanghong.,Chen, Li.,...&Liu, Zhaoping.(2014).Patterning of graphene microscale structures using electrohydrodynamic atomisation deposition of photoresist moulds.MICRO & NANO LETTERS,9(2),136. |
MLA | Wang, Dazhi,et al."Patterning of graphene microscale structures using electrohydrodynamic atomisation deposition of photoresist moulds".MICRO & NANO LETTERS 9.2(2014):136. |
入库方式: OAI收割
来源:宁波材料技术与工程研究所
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