Effects of oxygen plasma treatment on the surface properties of Ga-doped ZnO thin films
文献类型：期刊论文
| 作者 | Xue, Ya ; He, Haiping ; Jin, Yizheng ; Lu, Bin ; Cao, Hongtao ; Jiang, Jie ; Bai, Sai ; Ye, Zhizhen |
| 刊名 | APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
 |
| 出版日期 | 2014 |
| 卷号 | 114期号:2页码:509 |
| 中文摘要 | We report that oxygen plasma treatment significantly changes the surface properties of Ga-doped ZnO (GZO) thin films, leading to an increase of work function and a large reduction in contact angles. We attribute the increase of work function of the GZO thin films after oxygen plasma treatment to both the lowering of the Fermi level and the shift in ionization potential. |
| 公开日期 | 2015-09-20 |
| 源URL | [http://ir.nimte.ac.cn/handle/174433/11951]  |
| 专题 | 宁波材料技术与工程研究所_2014专题 |
| 推荐引用方式 GB/T 7714 | Xue, Ya,He, Haiping,Jin, Yizheng,et al. Effects of oxygen plasma treatment on the surface properties of Ga-doped ZnO thin films[J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING,2014,114(2):509. |
| APA | Xue, Ya.,He, Haiping.,Jin, Yizheng.,Lu, Bin.,Cao, Hongtao.,...&Ye, Zhizhen.(2014).Effects of oxygen plasma treatment on the surface properties of Ga-doped ZnO thin films.APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING,114(2),509. |
| MLA | Xue, Ya,et al."Effects of oxygen plasma treatment on the surface properties of Ga-doped ZnO thin films".APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING 114.2(2014):509. |
入库方式： OAI收割
来源：宁波材料技术与工程研究所
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