A scaling law of photoionization in few-cycle regime
文献类型:期刊论文
作者 | Zhang JT(张敬涛) ; Bai LH(白丽华) ; Gong SQ(龚尚庆) ; Xu ZZ(徐至展) |
刊名 | opt. express
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出版日期 | 2007 |
卷号 | 15期号:12页码:7261 |
关键词 | Ionization potential Kinetic energy Photoelectrons Photoionization |
ISSN号 | 1094-4087 |
中文摘要 | in this paper, a scaling law of photoionization of atoms irradiated by intense, few- cycle laser pulses is established. the scaling law sets a relation to the phase- dependent ionization with the kinetic energy of photoelectrons, the duration and peak intensity of short pulses, and the ionization potential of the target atoms. we find that it will be advantageous to manifest the phase- dependent photoionization by choosing the target atoms with larger ionization potential, using laser with smaller carrier- frequency, and increasing the pulse intensity. (c) 2007 optical society of america. |
收录类别 | EI |
语种 | 英语 |
WOS记录号 | WOS:000248359700022 |
公开日期 | 2009-09-18 |
源URL | [http://ir.siom.ac.cn/handle/181231/980] ![]() |
专题 | 上海光学精密机械研究所_强场激光物理国家重点实验室 |
推荐引用方式 GB/T 7714 | Zhang JT,Bai LH,Gong SQ,et al. A scaling law of photoionization in few-cycle regime[J]. opt. express,2007,15(12):7261, 7268. |
APA | 张敬涛,白丽华,龚尚庆,&徐至展.(2007).A scaling law of photoionization in few-cycle regime.opt. express,15(12),7261. |
MLA | 张敬涛,et al."A scaling law of photoionization in few-cycle regime".opt. express 15.12(2007):7261. |
入库方式: OAI收割
来源:上海光学精密机械研究所
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