中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Freestanding silicon films formed on ionic liquid surfaces

文献类型:期刊论文

作者Cheng, Shimin1,2,3; Hu, Linyan1,2; Qin, Wei1,2,3; Xiong, Fengqiang1,2,3; Li, Can1,2
刊名journal of materials chemistry a
出版日期2013
卷号1期号:1页码:55-58
英文摘要freestanding silicon films with a thickness ranging from 1 nm to several micrometers were prepared by cat-cvd onto ionic liquid ([bmim][bf4]) surfaces for the first time. the films, obtained without a solid substrate, can be facilely characterized by tem and afm to study the film formation and growth process.
WOS标题词science & technology ; physical sciences ; technology
类目[WOS]chemistry, physical ; energy & fuels ; materials science, multidisciplinary
研究领域[WOS]chemistry ; energy & fuels ; materials science
关键词[WOS]sputter-deposition technique ; chemical-vapor-deposition ; solar-cells ; nanoparticles ; solvents ; telescope
收录类别SCI
语种英语
WOS记录号WOS:000314598400007
公开日期2015-11-10
源URL[http://159.226.238.44/handle/321008/137516]  
专题大连化学物理研究所_中国科学院大连化学物理研究所
作者单位1.Chinese Acad Sci, Dalian Inst Chem Phys, State Key Lab Catalysis, Dalian 116023, Peoples R China
2.Dalian Natl Lab Clean Energy, Dalian 116023, Peoples R China
3.Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China
推荐引用方式
GB/T 7714
Cheng, Shimin,Hu, Linyan,Qin, Wei,et al. Freestanding silicon films formed on ionic liquid surfaces[J]. journal of materials chemistry a,2013,1(1):55-58.
APA Cheng, Shimin,Hu, Linyan,Qin, Wei,Xiong, Fengqiang,&Li, Can.(2013).Freestanding silicon films formed on ionic liquid surfaces.journal of materials chemistry a,1(1),55-58.
MLA Cheng, Shimin,et al."Freestanding silicon films formed on ionic liquid surfaces".journal of materials chemistry a 1.1(2013):55-58.

入库方式: OAI收割

来源:大连化学物理研究所

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