Numerical study of He/CF3I pulsed discharge used to produce iodine atom in chemical oxygen-iodine laser
文献类型：期刊论文
| 作者 | Zhang, Jiao1; Wang, Yanhui1; Duo, Liping2; Li, Guofu2; Wang, Dezhen1 |
| 刊名 | physics of plasmas
 |
| 出版日期 | 2013-04-01 |
| 卷号 | 20期号:4 |
| 英文摘要 | the pulsed discharge for producing iodine atoms from the alkyl and perfluoroalky iodides (ch3i, cf3i, etc.) is the most efficient method for achieving the pulse operating mode of a chemical oxygen-iodine laser. in this paper, a one-dimensional fluid model is developed to study the characteristics of pulsed discharge in cf3i-he mixture. by solving continuity equation, momentum equation, poisson equation, boltzmann equation, and an electric circuit equation, the temporal evolution of discharge current density and various discharge products, especially the atomic iodine, are investigated. the dependence of iodine atom density on discharge parameters is also studied. the results show that iodine atom density increases with the pulsed width and pulsed voltage amplitude. the mixture ratio of cf3i and helium plays a more significant role in iodine atom production. for a constant voltage amplitude, there exists an optimal mixture ratio under which the maximum iodine atom concentration is achieved. the bigger the applied voltage amplitude is, the higher partial pressure of cf3i is needed to obtain the maximum iodine atom concentration. (c) 2013 aip publishing llc [http://dx.doi.org/10.1063/1.4802032] |
| WOS标题词 | science & technology ; physical sciences |
| 类目[WOS] | physics, fluids & plasmas |
| 研究领域[WOS] | physics |
| 关键词[WOS] | pressure ; helium ; model |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000318241900074 |
| 公开日期 | 2015-11-10 |
| 源URL | [http://159.226.238.44/handle/321008/137788]  |
| 专题 | 大连化学物理研究所_中国科学院大连化学物理研究所 |
| 作者单位 | 1.Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China 2.Chinese Acad Sci, Dalian Inst Chem Phys, Dalian 116024, Peoples R China |
| 推荐引用方式 GB/T 7714 | Zhang, Jiao,Wang, Yanhui,Duo, Liping,et al. Numerical study of He/CF3I pulsed discharge used to produce iodine atom in chemical oxygen-iodine laser[J]. physics of plasmas,2013,20(4). |
| APA | Zhang, Jiao,Wang, Yanhui,Duo, Liping,Li, Guofu,&Wang, Dezhen.(2013).Numerical study of He/CF3I pulsed discharge used to produce iodine atom in chemical oxygen-iodine laser.physics of plasmas,20(4). |
| MLA | Zhang, Jiao,et al."Numerical study of He/CF3I pulsed discharge used to produce iodine atom in chemical oxygen-iodine laser".physics of plasmas 20.4(2013). |
入库方式： OAI收割
来源：大连化学物理研究所
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