Influence of CeO2 and Co3O(4) promoters on carbon deposition and carbon elimination over Ni-based catalysts
文献类型：期刊论文
| 作者 | Yang, YL; Li, WZ; Xu, HY |
| 刊名 | chinese journal of catalysis
 |
| 出版日期 | 2002-11-01 |
| 卷号 | 23期号:6页码:517-520 |
| 关键词 | metal-semiconductor interaction nickel-based catalyst cerium oxide cobalt oxide carbon deposition carbon elimination |
| 英文摘要 | the influence of the addition of ceo2 or co3o4 promoter on carbon deposition by ch4 and carbon elimination by co2 over nickel-based catalysts was studied by using pulse reaction as well as bet, tga, xps, h-2-chemisorption and co2-tpsr techniques. the addition of n-type semiconductor ceo2 decreased carbon deposition activity of ch4 and increased carbon elimination ability of co2. however, the addition of co3o4 improved carbon deposition by ch4 and. resisted carbon elimination by co2. compared with ni/al2o3 catalyst, the modified catalysts ni/ceo2-al2o3 and ni/co3o4-al2o3 show no change in specific surface area and pore volume. thereby, it should be considered that there is no any relation between the carbon. deposition or carbon elimination and the specific surface area or the pore volume of the catalysts. also, the changes in particle size and metallic surface area by the adding of metal additives were not remarkable compared with ni/al2o3 catalyst. there is an interaction between active metal ni and semiconductor oxide ceo2 and the addition of ceo2 can increase the d-electron density of active atom ni, which would inhibit the migration of c-h a-electron from ch4 molecule to d-orbital of ni atom, thus decreasing the amount of ch4 adsorbed on ni sites and the extent of carbon deposition. on the contrary, in the case of co2, the electron-rich character of ni sites, which is strengthened by the addition of n-type semiconductor ceo2, is beneficial to co2 adsorption, thus leading to an enhancement of carbon elimination. metal-semiconductor interaction is the most important factor for the above phenomenon. |
| WOS标题词 | science & technology ; physical sciences ; technology |
| 类目[WOS] | chemistry, applied ; chemistry, physical ; engineering, chemical |
| 研究领域[WOS] | chemistry ; engineering |
| 关键词[WOS] | synthesis gas ; partial oxidation ; methane ; dioxide ; syngas ; ni/alpha-al2o3 |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000179903200010 |
| 公开日期 | 2015-11-10 |
| 源URL | [http://159.226.238.44/handle/321008/139110]  |
| 专题 | 大连化学物理研究所_中国科学院大连化学物理研究所 |
| 作者单位 | Chinese Acad Sci, Dalian Inst Chem Phys, Dalian 116023, Peoples R China |
| 推荐引用方式 GB/T 7714 | Yang, YL,Li, WZ,Xu, HY. Influence of CeO2 and Co3O(4) promoters on carbon deposition and carbon elimination over Ni-based catalysts[J]. chinese journal of catalysis,2002,23(6):517-520. |
| APA | Yang, YL,Li, WZ,&Xu, HY.(2002).Influence of CeO2 and Co3O(4) promoters on carbon deposition and carbon elimination over Ni-based catalysts.chinese journal of catalysis,23(6),517-520. |
| MLA | Yang, YL,et al."Influence of CeO2 and Co3O(4) promoters on carbon deposition and carbon elimination over Ni-based catalysts".chinese journal of catalysis 23.6(2002):517-520. |
入库方式： OAI收割
来源：大连化学物理研究所
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