Photoemission study of CCl(4) adsorption on Si(111)-7x7
文献类型:期刊论文
作者 | Yao, Yunxi; Fu, Qiang; Tan, Dali; Bao, Xinhe |
刊名 | surface science
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出版日期 | 2008-07-01 |
卷号 | 602期号:13页码:2183-2188 |
关键词 | X-ray photoelectron spectroscopy ultraviolet photoelectron spectroscopy chemisorption silicon solid-gas interfaces carbon tetrachloride |
英文摘要 | adsorption of carbon tetrachloride (ccl(4)) on si(111)-7 x 7 at room temperature (rt) and low temperature (lt) was investigated by x-ray photoelectron spectroscopy (xps) and ultraviolet photoelectron spectroscopy (ups). it was demonstrated that at rt ccl(4) dissociates on the si(111)-7 x 7 surface leaving the surface extensively adsorbed with atomic cl species. the dissociated cl shows site preference to si restatoms resulting in quick extinction of dangling bonds at the si restatoms. at lt (around 120 k), both molecular and dissociative adsorption of ccl(4) occurs, which produces cl, ccl(x) (x <= 3), and ccl(4) on the surface. the dangling bonds at the restatoms and adatoms were simultaneously quenched upon the lt ccl(4) adsorption. the site selectivity of restatoms to adatoms for molecule adsorption on the si(l 11)-7 x 7 surface is discussed. (c) 2008 elsevier b.v. all rights reserved. |
WOS标题词 | science & technology ; physical sciences |
类目[WOS] | chemistry, physical ; physics, condensed matter |
研究领域[WOS] | chemistry ; physics |
关键词[WOS] | scanning-tunneling-microscopy ; synchrotron-radiation ; surface-chemistry ; oxygen-adsorption ; site selectivity ; cl adsorption ; dissociation ; desorption ; hydrogen ; chemisorption |
收录类别 | SCI |
语种 | 英语 |
WOS记录号 | WOS:000257837500011 |
公开日期 | 2015-11-17 |
源URL | [http://159.226.238.44/handle/321008/141046] ![]() |
专题 | 大连化学物理研究所_中国科学院大连化学物理研究所 |
作者单位 | Chinese Acad Sci, State Key Lab Catalysis, Dalian Inst Chem Phys, Dalian 116023, Peoples R China |
推荐引用方式 GB/T 7714 | Yao, Yunxi,Fu, Qiang,Tan, Dali,et al. Photoemission study of CCl(4) adsorption on Si(111)-7x7[J]. surface science,2008,602(13):2183-2188. |
APA | Yao, Yunxi,Fu, Qiang,Tan, Dali,&Bao, Xinhe.(2008).Photoemission study of CCl(4) adsorption on Si(111)-7x7.surface science,602(13),2183-2188. |
MLA | Yao, Yunxi,et al."Photoemission study of CCl(4) adsorption on Si(111)-7x7".surface science 602.13(2008):2183-2188. |
入库方式: OAI收割
来源:大连化学物理研究所
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