Modulated photothermal reflectance technique for measuring thermal conductivity of nano film on substrate and thermal boundary resistance
文献类型：期刊论文
| 作者 | Bu, W. F.1; Tang, D. W.1; Wang, Z. L.1; Zheng, X. H.1; Cheng, G. H.2 |
| 刊名 | THIN SOLID FILMS
 |
| 出版日期 | 2008-10-01 |
| 卷号 | 516期号:23页码:8359-8362 |
| 关键词 | Photothermal reflectance technique Interface thermal resistance Simulation Annealing Algorithm Thermal conductivity Nano film Silicon dioxide Thin films Thermal boundary resistance |
| 英文摘要 | The thermal conductivities of thermally oxidated SiO2 films of 98 nm, 148 nm, and 322 nm in thickness on Si substrate are measured using modulated photothermal reflectance technique. In the measuring principle, the equivalent transmission-line analysis is applied to the multilayer heat conduction problem and the simulated annealing algorithm is applied in the inverse analysis for determining the thermal conductivity and thermal boundary resistance. The thermal conductivity of the nano-SiO2 film is found being less than its bulk value and thickness dependent. The thermal boundary resistance between SiO2 and Al coating is found being comparable to the thermal resistance of the SiO2 layer. (C) 2008 Elsevier B.V. All rights reserved. |
| WOS标题词 | Science & Technology ; Technology ; Physical Sciences |
| 类目[WOS] | Materials Science, Multidisciplinary ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter |
| 研究领域[WOS] | Materials Science ; Physics |
| 关键词[WOS] | THIN-FILMS ; THERMOREFLECTANCE MICROSCOPY ; HEAT-CONDUCTION ; SILICON |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000260579800023 |
| 公开日期 | 2015-12-22 |
| 源URL | [http://ir.etp.ac.cn/handle/311046/106380]  |
| 专题 | 工程热物理研究所_中国科学院工程热物理所（论文库）_期刊论文（SCI） |
| 作者单位 | 1.Chinese Acad Sci, Inst Engn Thermophys, Beijing 100080, Peoples R China 2.Chinese Acad Sci, Xian Inst Opt & Precis Mech, Xian 7710119, Peoples R China |
| 推荐引用方式 GB/T 7714 | Bu, W. F.,Tang, D. W.,Wang, Z. L.,et al. Modulated photothermal reflectance technique for measuring thermal conductivity of nano film on substrate and thermal boundary resistance[J]. THIN SOLID FILMS,2008,516(23):8359-8362. |
| APA | Bu, W. F.,Tang, D. W.,Wang, Z. L.,Zheng, X. H.,&Cheng, G. H..(2008).Modulated photothermal reflectance technique for measuring thermal conductivity of nano film on substrate and thermal boundary resistance.THIN SOLID FILMS,516(23),8359-8362. |
| MLA | Bu, W. F.,et al."Modulated photothermal reflectance technique for measuring thermal conductivity of nano film on substrate and thermal boundary resistance".THIN SOLID FILMS 516.23(2008):8359-8362. |
入库方式： OAI收割
来源：工程热物理研究所
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