Fast Plasma Sintering Deposition of Nano-structured Silicon Carbide Coatings
文献类型：期刊论文
| 作者 | Huang HJ(黄河激) ; Fu ZQ(付志强); Pan WX(潘文霞); Wu CK(吴承康)
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| 刊名 | Physics Procedia
 |
| 出版日期 | 2012 |
| 卷号 | 32页码:598-604 |
| 关键词 | reduced-pressure plasma sintering deposition silicon carbide coating ultrafast deposition |
| ISSN号 | 1875-3892 |
| 中文摘要 | Fast plasma sintering deposition of SiC nano-structured coatings was achieved using a specially designed non-transferred dc plasma torch operated at reduced pressure. Employing the Taguchi method, the deposition parameters were optimized and verified. With the optimized combination of deposition parameters, homogeneous SiC coatings were deposited on relatively large area substrates of Φ50 mm and 50×50 mm with a deposition rate as high as 20 μm/min. Ablation test showed that such coatings can be used as oxidation resistance coatings in high temperature oxidizing environment. |
| 收录类别 | CPCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000310677500086 |
| 源URL | [http://dspace.imech.ac.cn/handle/311007/58192]  |
| 专题 | 力学研究所_高温气体动力学国家重点实验室 |
| 推荐引用方式 GB/T 7714 | Huang HJ,Fu ZQ,Pan WX,et al. Fast Plasma Sintering Deposition of Nano-structured Silicon Carbide Coatings[J]. Physics Procedia,2012,32:598-604. |
| APA | Huang HJ,Fu ZQ,Pan WX,&Wu CK.(2012).Fast Plasma Sintering Deposition of Nano-structured Silicon Carbide Coatings.Physics Procedia,32,598-604. |
| MLA | Huang HJ,et al."Fast Plasma Sintering Deposition of Nano-structured Silicon Carbide Coatings".Physics Procedia 32(2012):598-604. |
入库方式： OAI收割
来源：力学研究所
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