Investigation on thermal stability of Ta2O5 for application at high temperature, TiO2 and Al2O3 coatings
文献类型：期刊论文
| 作者 | Shang, Peng1,2; Xiong, Shengming1; Li, Linghui1; Tian, Dong1; Ai, Wanjun1 |
| 刊名 | APPLIED SURFACE SCIENCE
 |
| 出版日期 | 2013-11-15 |
| 卷号 | 285页码:713-720 |
| 关键词 | Thermal stability TiO2/Ta-2 O-5/Al-2 O-3 Coating Mismatch |
| 英文摘要 | In this paper, tantalum pentoxide (Ta-2 Os), titanium dioxide (TiO2) and aluminum oxide (Al2O3) coatings are deposited on silicon substrates by ion beam sputtering (IBS). The influences of the thermal exposure at high temperature in air on the surface morphology, roughness, and the structure were investigated. The results indicate that the chemical composition of the as-deposited TiO2 and Ta2O5 coatings are apparently close to the stoichiometry ratios and both of them are amorphous structures. The peaks corresponding to anatase TiO2 appear at 400 degrees C while the anatase-to-rutile transformation is not observed after 800 degrees C and 1000 degrees C bake. Ta2O5 coating crystallizes at 800 degrees C and 1000 degrees C to form the hexagonal structure and orthorhombic structure, respectively. TiO2 and Al2O3 single layers all develop catastrophic damage at 400 degrees C in the form of noted spallation or blisters, whereas there is no visible damage for the Ta2O5 coating even at 1000 degrees C. To understand possible damage mechanisms, the thermal stress distributions through the thickness of Ta2O5 and TiO2 coatings and the influence of the microstructure transformation are discussed. Finally, some possible approaches to improve the thermal stability are also proposed. (C) 2013 Elsevier B.V. All rights reserved. |
| WOS标题词 | Science & Technology ; Physical Sciences ; Technology |
| 类目[WOS] | Chemistry, Physical ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter |
| 研究领域[WOS] | Chemistry ; Materials Science ; Physics |
| 关键词[WOS] | CHEMICAL-VAPOR-DEPOSITION ; THIN-FILMS ; OXIDE-FILMS ; CRYSTALLIZATION |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000326579400084 |
| 公开日期 | 2015-12-24 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/1150]  |
| 专题 | 光电技术研究所_光电技术研究所被WoS收录文章 |
| 作者单位 | 1.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China 2.Chinese Acad Sci, Grad Sch, Beijing 100039, Peoples R China |
| 推荐引用方式 GB/T 7714 | Shang, Peng,Xiong, Shengming,Li, Linghui,et al. Investigation on thermal stability of Ta2O5 for application at high temperature, TiO2 and Al2O3 coatings[J]. APPLIED SURFACE SCIENCE,2013,285:713-720. |
| APA | Shang, Peng,Xiong, Shengming,Li, Linghui,Tian, Dong,&Ai, Wanjun.(2013).Investigation on thermal stability of Ta2O5 for application at high temperature, TiO2 and Al2O3 coatings.APPLIED SURFACE SCIENCE,285,713-720. |
| MLA | Shang, Peng,et al."Investigation on thermal stability of Ta2O5 for application at high temperature, TiO2 and Al2O3 coatings".APPLIED SURFACE SCIENCE 285(2013):713-720. |
入库方式： OAI收割
来源：光电技术研究所
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