中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Combined frequency- and time-domain photocarrier radiometry characterization of ion-implanted and thermally annealed silicon wafers

文献类型:期刊论文

作者Ren Sheng-Dong1,2; Li Bin-Cheng1; Gao Li-Feng1; Wang Qian1,2
刊名CHINESE PHYSICS B
出版日期2013-05-01
卷号22期号:5
关键词photocarrier radiometry ion implantation effective lifetime silicon
英文摘要A combined frequency-swept and quasi-time-domain photocarrier radiometry (PCR) technique was developed to characterize thermally annealed silicon wafers with B+, P+, and As+ ion implantation at doses ranging from 1x10(11) cm(-2) to 1x10(16) cm(-2). The implantation dose dependence of the PCR amplitude, the frequency dependencies of the PCR amplitude and phase, as well as the quasi-time-domain PCR waveforms were simultaneously employed to analyze all the ion-implanted silicon samples. The dependence of the effective lifetime on the implantation dose has been investigated and shown to be related to the trap density and the lifetime extracted from the transient PCR signals.
WOS标题词Science & Technology ; Physical Sciences
类目[WOS]Physics, Multidisciplinary
研究领域[WOS]Physics
关键词[WOS]LIGHT-EMITTING-DIODES ; DISLOCATION LOOPS ; BORON ; DIFFUSION ; SI
收录类别SCI
语种英语
WOS记录号WOS:000319498300072
公开日期2015-12-24
源URL[http://ir.ioe.ac.cn/handle/181551/1184]  
专题光电技术研究所_光电技术研究所被WoS收录文章
作者单位1.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China
2.Univ Chinese Acad Sci, Beijing 100049, Peoples R China
推荐引用方式
GB/T 7714
Ren Sheng-Dong,Li Bin-Cheng,Gao Li-Feng,et al. Combined frequency- and time-domain photocarrier radiometry characterization of ion-implanted and thermally annealed silicon wafers[J]. CHINESE PHYSICS B,2013,22(5).
APA Ren Sheng-Dong,Li Bin-Cheng,Gao Li-Feng,&Wang Qian.(2013).Combined frequency- and time-domain photocarrier radiometry characterization of ion-implanted and thermally annealed silicon wafers.CHINESE PHYSICS B,22(5).
MLA Ren Sheng-Dong,et al."Combined frequency- and time-domain photocarrier radiometry characterization of ion-implanted and thermally annealed silicon wafers".CHINESE PHYSICS B 22.5(2013).

入库方式: OAI收割

来源:光电技术研究所

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