Influence of tilt moire fringe on alignment accuracy in proximity lithography
文献类型：期刊论文
| 作者 | Zhu, Jiangping1,2,3; Hu, Song1; Yu, Junsheng2; Tang, Yan1; Xu, Feng5; He, Yu1,3; Zhou, Shaolin4; Li, Lanlan1,3 |
| 刊名 | OPTICS AND LASERS IN ENGINEERING
 |
| 出版日期 | 2013-04-01 |
| 卷号 | 51期号:4页码:371-381 |
| 关键词 | Angular displacement Phase Tilt moire fringe Lithography alignment Linear displacement |
| 英文摘要 | A moire fringe alignment method based on dual gratings is proposed. This method uses the phase of moire fringe to measure the relative linear displacement between the mask and the wafer. In practical application, the tilt moire fringe can occur due to the incorrect positions of the mask alignment mark and the wafer alignment mark or one of them. In this work, the presence of tilt moire fringe and its influence on the alignment accuracy are thoroughly analyzed. The analysis and discussions on the relationship between the revised linear displacement and the theoretical linear displacement reveal that moire fringes with different tilt angles have different influences on the alignment accuracy. Experimental results are given to verify that the proposed method is accurate and feasible, which can be applied to lithography and other correlated fields. (C) 2012 Elsevier Ltd. All rights reserved. |
| WOS标题词 | Science & Technology ; Physical Sciences |
| 类目[WOS] | Optics |
| 研究领域[WOS] | Optics |
| 关键词[WOS] | PRECISION |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000314860500006 |
| 公开日期 | 2015-12-24 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/1194]  |
| 专题 | 光电技术研究所_光电技术研究所被WoS收录文章 |
| 作者单位 | 1.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China 2.Univ Elect Sci & Technol China, Sch Optoelect Informat, Chengdu 610054, Peoples R China 3.Chinese Acad Sci, Grad Univ, Beijing 100039, Peoples R China 4.S China Univ Technol, Sch Elect & Informat, Guangzhou 510640, Guangdong, Peoples R China 5.SW Univ Sci & Technol, Informat Engn Coll, Mianyang 621010, Peoples R China |
| 推荐引用方式 GB/T 7714 | Zhu, Jiangping,Hu, Song,Yu, Junsheng,et al. Influence of tilt moire fringe on alignment accuracy in proximity lithography[J]. OPTICS AND LASERS IN ENGINEERING,2013,51(4):371-381. |
| APA | Zhu, Jiangping.,Hu, Song.,Yu, Junsheng.,Tang, Yan.,Xu, Feng.,...&Li, Lanlan.(2013).Influence of tilt moire fringe on alignment accuracy in proximity lithography.OPTICS AND LASERS IN ENGINEERING,51(4),371-381. |
| MLA | Zhu, Jiangping,et al."Influence of tilt moire fringe on alignment accuracy in proximity lithography".OPTICS AND LASERS IN ENGINEERING 51.4(2013):371-381. |
入库方式： OAI收割
来源：光电技术研究所
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