A new synchronization control method of wafer and reticle stage in step and scan lithographic equipment
文献类型：期刊论文
| 作者 | Li, Lanlan1,2; Hu, Song1; Zhao, Lixin1; Ma, Ping1; Li, Jinlong1,2; Zhong, Lingna1,2 |
| 刊名 | OPTIK
 |
| 出版日期 | 2013 |
| 卷号 | 124期号:24页码:6861-6865 |
| 关键词 | Scanner Synchronization error Tracking error Phase difference |
| 英文摘要 | Quality of exposures in step and scan lithographic equipment (scanner) highly depends on the synchronization of wafer and reticle stage. In order to increase the synchronization between the two stages, a method of increasing the correlation through reducing the phase difference between the tracking errors of the two stages is presented. Theoretical analysis with respect to application of increasing the correlation coefficients is performed. Validation of this process is verified through simulation and the results indicate that the moving average (MA) and moving standard deviation (MSD) of the synchronization error can be reduced effectively through our method. (C) 2013 Elsevier GmbH. All rights reserved. |
| WOS标题词 | Science & Technology ; Physical Sciences |
| 类目[WOS] | Optics |
| 研究领域[WOS] | Optics |
| 关键词[WOS] | PERFORMANCE ; SYSTEM ; DESIGN |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000327685700081 |
| 公开日期 | 2015-12-24 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/1227]  |
| 专题 | 光电技术研究所_光电技术研究所被WoS收录文章 |
| 作者单位 | 1.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China 2.Univ Chinese Acad Sci, Beijing 100039, Peoples R China |
| 推荐引用方式 GB/T 7714 | Li, Lanlan,Hu, Song,Zhao, Lixin,et al. A new synchronization control method of wafer and reticle stage in step and scan lithographic equipment[J]. OPTIK,2013,124(24):6861-6865. |
| APA | Li, Lanlan,Hu, Song,Zhao, Lixin,Ma, Ping,Li, Jinlong,&Zhong, Lingna.(2013).A new synchronization control method of wafer and reticle stage in step and scan lithographic equipment.OPTIK,124(24),6861-6865. |
| MLA | Li, Lanlan,et al."A new synchronization control method of wafer and reticle stage in step and scan lithographic equipment".OPTIK 124.24(2013):6861-6865. |
入库方式： OAI收割
来源：光电技术研究所
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