Subwavelength Demagnification Imaging and Lithography Using Hyperlens with a Plasmonic Reflector Layer
文献类型：期刊论文
| 作者 | Ren, Guowei; Wang, Changtao; Yi, Guangwei; Tao, Xing; Luo, Xiangang |
| 刊名 | PLASMONICS
 |
| 出版日期 | 2013-06-01 |
| 卷号 | 8期号:2页码:1065-1072 |
| 关键词 | Multilayers Subwavelength structures Metamaterials Plasmonics |
| 英文摘要 | Unlike the case in magnification mode, it is found that hyperlens employed in demagnification and lithography manner encounters great degradation of imaging quality especially for high-resolution image features. This problem mainly arises from the transversal magnetic polarization feature of light which delivers reduced contrast of electronic components intensity profile at the imaging region. Hyperlens with plasmonic reflector layer is designed for subwavelength demagnification imaging and photolithography. Analytical equations and numerical simulations show amplification of reflected evanescent waves in photoresist sandwiched by hyperlens and plasmonic reflectors in cylindrical geometry. The image quality features including resolution, contrast, and intensity can be improved significantly. Also presented are the dependence and influence of geometry parameters on imaging quality. Numerical demonstrations are given with about 15 nm half-pitch resolution imaging at illuminating wavelength of 365 nm. |
| WOS标题词 | Science & Technology ; Physical Sciences ; Technology |
| 类目[WOS] | Chemistry, Physical ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary |
| 研究领域[WOS] | Chemistry ; Science & Technology - Other Topics ; Materials Science |
| 关键词[WOS] | OPTICAL HYPERLENS ; DIFFRACTION LIMIT ; SUPERLENS ; METAL ; LENS |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000320445700118 |
| 公开日期 | 2015-12-24 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/1235]  |
| 专题 | 光电技术研究所_光电技术研究所被WoS收录文章 |
| 作者单位 | Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Nanofabricat & Microeng, Chengdu 610209, Peoples R China |
| 推荐引用方式 GB/T 7714 | Ren, Guowei,Wang, Changtao,Yi, Guangwei,et al. Subwavelength Demagnification Imaging and Lithography Using Hyperlens with a Plasmonic Reflector Layer[J]. PLASMONICS,2013,8(2):1065-1072. |
| APA | Ren, Guowei,Wang, Changtao,Yi, Guangwei,Tao, Xing,&Luo, Xiangang.(2013).Subwavelength Demagnification Imaging and Lithography Using Hyperlens with a Plasmonic Reflector Layer.PLASMONICS,8(2),1065-1072. |
| MLA | Ren, Guowei,et al."Subwavelength Demagnification Imaging and Lithography Using Hyperlens with a Plasmonic Reflector Layer".PLASMONICS 8.2(2013):1065-1072. |
入库方式： OAI收割
来源：光电技术研究所
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