Single closed fringe pattern phase demodulation in alignment of nanolithography
文献类型：期刊论文
| 作者 | Xu, Feng1,2; Hu, Song1; Yang, Yong1; Li, Jinlong1,2; Li, Lanlan1,2 |
| 刊名 | OPTIK
 |
| 出版日期 | 2013 |
| 卷号 | 124期号:9页码:818-823 |
| 关键词 | Alignment Closed fringe Phase demodulation 2-D wavelet ridge |
| 英文摘要 | The single closed fringe pattern that occurs in two superposed grating marks applied in the previously designed moire alignment scheme based on dual-grating for lithography is processed and analyzed using a frequency domain method based on two-dimensional (2-D) analytic wavelet transform (AWT) and 2-D wavelet ridge algorithm. The sign ambiguities, which always occur in the process of single closed fringe pattern analysis, are removed through the discontinuities of the angle in the 2-D wavelet ridge. Theoretical analysis regarding application of 2-D AWT and 2-D wavelet ridge to the interference fringe in alignment is performed. Verification of this process is carried out through numerical simulation and experiment. Results indicate that the background and noise in the fringes can be filtered effectively through our method, and the phase information can be obtained successfully. (C) 2012 Elsevier GmbH. All rights reserved. |
| WOS标题词 | Science & Technology ; Physical Sciences |
| 类目[WOS] | Optics |
| 研究领域[WOS] | Optics |
| 关键词[WOS] | WINDOWED FOURIER-TRANSFORM ; X-RAY-LITHOGRAPHY ; MOIRE FRINGE ; INTERFEROMETRY ; SYSTEM ; EXTRACTION ; ALGORITHM |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000318056600010 |
| 公开日期 | 2015-12-24 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/1237]  |
| 专题 | 光电技术研究所_光电技术研究所被WoS收录文章 |
| 作者单位 | 1.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China 2.Chinese Acad Sci, Grad Univ, Beijing 100039, Peoples R China |
| 推荐引用方式 GB/T 7714 | Xu, Feng,Hu, Song,Yang, Yong,et al. Single closed fringe pattern phase demodulation in alignment of nanolithography[J]. OPTIK,2013,124(9):818-823. |
| APA | Xu, Feng,Hu, Song,Yang, Yong,Li, Jinlong,&Li, Lanlan.(2013).Single closed fringe pattern phase demodulation in alignment of nanolithography.OPTIK,124(9),818-823. |
| MLA | Xu, Feng,et al."Single closed fringe pattern phase demodulation in alignment of nanolithography".OPTIK 124.9(2013):818-823. |
入库方式： OAI收割
来源：光电技术研究所
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