Demagnifying far field focusing spot to deep subwavelength scale by truncated hyperlens for nanolithography
文献类型：期刊论文
| 作者 | Yao, Na; Wang, Changtao; Ren, Guowei; Zhao, Zeyu; Feng, Qin; Luo, Xiangang |
| 刊名 | SUPERLATTICES AND MICROSTRUCTURES
 |
| 出版日期 | 2012-07-01 |
| 卷号 | 52期号:1页码:63-69 |
| 关键词 | Super resolution Photolithography Surface plasmon |
| 英文摘要 | A truncated hyperlens composed of pairs of metal-dielectric cylindrical multilayers is proposed to demagnify the diffraction limited spot to achieve deep subwavelength imaging. The diffraction limited spot is focused by far field converging cylindrical wave. Numerical simulations demonstrate that full width at half maximum (FWHM) of the image down to 32 nm (similar to lambda/11) can be achieved from object (similar to lambda/3) by 365 nm light illumination. It is discussed that the influence of size and focusing shift of the spot on those of the demagnification image on photoresist. It is also demonstrated that multi-objects can be demagnified and projected on the photoresist. (C) 2012 Elsevier Ltd. All rights reserved. |
| WOS标题词 | Science & Technology ; Physical Sciences |
| 类目[WOS] | Physics, Condensed Matter |
| 研究领域[WOS] | Physics |
| 关键词[WOS] | INTERFERENCE LITHOGRAPHY ; DIFFRACTION LIMIT ; OPTICAL HYPERLENS ; PERFECT LENS ; SILICON ; PHOTOLITHOGRAPHY ; TRANSFORMATION ; SUPERLENS ; LASER ; NM |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000305775700008 |
| 公开日期 | 2015-12-24 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/2345]  |
| 专题 | 光电技术研究所_光电技术研究所被WoS收录文章 |
| 作者单位 | Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Nanofabricat & Microeng, Chengdu 610209, Peoples R China |
| 推荐引用方式 GB/T 7714 | Yao, Na,Wang, Changtao,Ren, Guowei,et al. Demagnifying far field focusing spot to deep subwavelength scale by truncated hyperlens for nanolithography[J]. SUPERLATTICES AND MICROSTRUCTURES,2012,52(1):63-69. |
| APA | Yao, Na,Wang, Changtao,Ren, Guowei,Zhao, Zeyu,Feng, Qin,&Luo, Xiangang.(2012).Demagnifying far field focusing spot to deep subwavelength scale by truncated hyperlens for nanolithography.SUPERLATTICES AND MICROSTRUCTURES,52(1),63-69. |
| MLA | Yao, Na,et al."Demagnifying far field focusing spot to deep subwavelength scale by truncated hyperlens for nanolithography".SUPERLATTICES AND MICROSTRUCTURES 52.1(2012):63-69. |
入库方式： OAI收割
来源：光电技术研究所
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