Alignment method based on matched dual-grating moire fringe for proximity lithography
文献类型：期刊论文
| 作者 | Zhu, Jiangping1,2,3; Hu, Song1; Yu, Junsheng2; Tang, Yan1 |
| 刊名 | OPTICAL ENGINEERING
 |
| 出版日期 | 2012-11-01 |
| 卷号 | 51期号:11 |
| 关键词 | lithography alignment moire fringe angular displacement |
| 英文摘要 | The application of dual-grating moire fringe is introduced in lithography alignment. Minute angular displacement between the two alignment marks will lead to the tilt of moire fringe, which has an influence in high-accuracy alignment. Proposed is a novel measurement method of angular displacement based on the phase of moire fringe. The relationship between phase of moire fringe and angular displacement is analyzed. Both simulation and experiment indicate that an angular displacement can be determined to achieve a linear displacement measurement with error of nanometer level. (C) 2012 Society of Photo-Optical Instrumentation Engineers (SPIE). [DOI: 10.1117/1.OE.51.11.113603] |
| WOS标题词 | Science & Technology ; Physical Sciences |
| 类目[WOS] | Optics |
| 研究领域[WOS] | Optics |
| 关键词[WOS] | X-RAY-LITHOGRAPHY ; GRAPHICAL ANALYSIS ; IMAGING METHOD ; SYSTEM ; PRECISION ; PATTERNS |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000314462100029 |
| 公开日期 | 2015-12-24 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/2378]  |
| 专题 | 光电技术研究所_光电技术研究所被WoS收录文章 |
| 作者单位 | 1.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China 2.Univ Elect Sci & Technol China, Sch Optoelect Informat, Chengdu 610054, Peoples R China 3.Chinese Acad Sci, Grad Univ, Beijing 100039, Peoples R China |
| 推荐引用方式 GB/T 7714 | Zhu, Jiangping,Hu, Song,Yu, Junsheng,et al. Alignment method based on matched dual-grating moire fringe for proximity lithography[J]. OPTICAL ENGINEERING,2012,51(11). |
| APA | Zhu, Jiangping,Hu, Song,Yu, Junsheng,&Tang, Yan.(2012).Alignment method based on matched dual-grating moire fringe for proximity lithography.OPTICAL ENGINEERING,51(11). |
| MLA | Zhu, Jiangping,et al."Alignment method based on matched dual-grating moire fringe for proximity lithography".OPTICAL ENGINEERING 51.11(2012). |
入库方式： OAI收割
来源：光电技术研究所
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