中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
The leveling of mask and wafer in proximity nanolithography using fringe pattern phase analysis

文献类型:期刊论文

作者Xu, Feng1,4; Zhou, Shaolin2; Hu, Song3
刊名OPTIK
出版日期2014
卷号125期号:13页码:3176-3180
关键词Nanolithography Leveling Fringe pattern analysis Phase extraction
英文摘要The fringe pattern phase analysis method is proposed for the leveling of mask and wafer in proximity lithography. The tilt between mask and wafer in the space is reflected in the tilted fringe pattern. The method combining the 2-D Fourier transform and 2-D Hanning window is proposed for processing the tilted fringe pattern. The offset and angle of tilt are extracted through phase analysis. Computer simulation and experiment are both performed to verify this method. The results indicate that the tilt of the mask and wafer in the space can be extracted with high accuracy through this method. (C) 2014 Elsevier GmbH. All rights reserved.
WOS标题词Science & Technology ; Physical Sciences
类目[WOS]Optics
研究领域[WOS]Optics
关键词[WOS]MOIRE FRINGE ; LITHOGRAPHY ; ALIGNMENT ; STEPPERS
收录类别SCI
语种英语
WOS记录号WOS:000337656400042
公开日期2015-12-24
源URL[http://ir.ioe.ac.cn/handle/181551/2418]  
专题光电技术研究所_光电技术研究所被WoS收录文章
作者单位1.Southwest Univ Sci & Technol, Fac Informat & Engn, Mianyang 621010, Sichuan, Peoples R China
2.S China Univ Technol, Sch Elect & Informat, Guangzhou 510640, Guangdong, Peoples R China
3.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China
4.Robot Technol Used Special Environm Key Lab Sichu, Mianyang 621010, Sichuan, Peoples R China
推荐引用方式
GB/T 7714
Xu, Feng,Zhou, Shaolin,Hu, Song. The leveling of mask and wafer in proximity nanolithography using fringe pattern phase analysis[J]. OPTIK,2014,125(13):3176-3180.
APA Xu, Feng,Zhou, Shaolin,&Hu, Song.(2014).The leveling of mask and wafer in proximity nanolithography using fringe pattern phase analysis.OPTIK,125(13),3176-3180.
MLA Xu, Feng,et al."The leveling of mask and wafer in proximity nanolithography using fringe pattern phase analysis".OPTIK 125.13(2014):3176-3180.

入库方式: OAI收割

来源:光电技术研究所

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