The leveling of mask and wafer in proximity nanolithography using fringe pattern phase analysis
文献类型：期刊论文
| 作者 | Xu, Feng1,4; Zhou, Shaolin2; Hu, Song3 |
| 刊名 | OPTIK
 |
| 出版日期 | 2014 |
| 卷号 | 125期号:13页码:3176-3180 |
| 关键词 | Nanolithography Leveling Fringe pattern analysis Phase extraction |
| 英文摘要 | The fringe pattern phase analysis method is proposed for the leveling of mask and wafer in proximity lithography. The tilt between mask and wafer in the space is reflected in the tilted fringe pattern. The method combining the 2-D Fourier transform and 2-D Hanning window is proposed for processing the tilted fringe pattern. The offset and angle of tilt are extracted through phase analysis. Computer simulation and experiment are both performed to verify this method. The results indicate that the tilt of the mask and wafer in the space can be extracted with high accuracy through this method. (C) 2014 Elsevier GmbH. All rights reserved. |
| WOS标题词 | Science & Technology ; Physical Sciences |
| 类目[WOS] | Optics |
| 研究领域[WOS] | Optics |
| 关键词[WOS] | MOIRE FRINGE ; LITHOGRAPHY ; ALIGNMENT ; STEPPERS |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000337656400042 |
| 公开日期 | 2015-12-24 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/2418]  |
| 专题 | 光电技术研究所_光电技术研究所被WoS收录文章 |
| 作者单位 | 1.Southwest Univ Sci & Technol, Fac Informat & Engn, Mianyang 621010, Sichuan, Peoples R China 2.S China Univ Technol, Sch Elect & Informat, Guangzhou 510640, Guangdong, Peoples R China 3.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China 4.Robot Technol Used Special Environm Key Lab Sichu, Mianyang 621010, Sichuan, Peoples R China |
| 推荐引用方式 GB/T 7714 | Xu, Feng,Zhou, Shaolin,Hu, Song. The leveling of mask and wafer in proximity nanolithography using fringe pattern phase analysis[J]. OPTIK,2014,125(13):3176-3180. |
| APA | Xu, Feng,Zhou, Shaolin,&Hu, Song.(2014).The leveling of mask and wafer in proximity nanolithography using fringe pattern phase analysis.OPTIK,125(13),3176-3180. |
| MLA | Xu, Feng,et al."The leveling of mask and wafer in proximity nanolithography using fringe pattern phase analysis".OPTIK 125.13(2014):3176-3180. |
入库方式： OAI收割
来源：光电技术研究所
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