中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Off Axis Illumination Planar Hyperlens for Non-contacted Deep Subwavelength Demagnifying Lithography

文献类型:期刊论文

作者Zhang, Wei; Yao, Na; Wang, Changtao; Zhao, Zeyu; Wang, Yanqin; Gao, Ping; Luo, Xiangang
刊名PLASMONICS
出版日期2014-12-01
卷号9期号:6页码:1333-1339
关键词Nanolithography Surface plasmon Illumination design
英文摘要Off axis illumination (OAI) technique combined with planar hyperlens is applied to achieve the non-contacted deep subwavelength demagnifying lithography. The designed OAI is confirmed to shift the spatial spectra of mask, leading to enhancement of the featured wavevectors components. On the other hand, the reflection effect of Ag cladding is necessary to obtain high contrast and high fidelity of nanopattern lithography. It is numerically demonstrated that the half-pitch resolution 32 nm with OAI (NA = 1.37) is obtained under 80 nm air working distance, which is about six times than the case of the conventional configuration under normal illumination (NA = 0). Further simulations show that the minimum half-pitch resolution of the planar hyperlens with OAI could reach 18 nm (similar to lambda/20).
WOS标题词Science & Technology ; Physical Sciences ; Technology
类目[WOS]Chemistry, Physical ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary
研究领域[WOS]Chemistry ; Science & Technology - Other Topics ; Materials Science
关键词[WOS]DIFFRACTION LIMIT ; SILVER SUPERLENS ; PERFECT LENS ; PHOTOLITHOGRAPHY
收录类别SCI
语种英语
WOS记录号WOS:000345146800010
公开日期2015-12-24
源URL[http://ir.ioe.ac.cn/handle/181551/2438]  
专题光电技术研究所_光电技术研究所被WoS收录文章
作者单位Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Nanofabricat & Microeng, Chengdu 610209, Peoples R China
推荐引用方式
GB/T 7714
Zhang, Wei,Yao, Na,Wang, Changtao,et al. Off Axis Illumination Planar Hyperlens for Non-contacted Deep Subwavelength Demagnifying Lithography[J]. PLASMONICS,2014,9(6):1333-1339.
APA Zhang, Wei.,Yao, Na.,Wang, Changtao.,Zhao, Zeyu.,Wang, Yanqin.,...&Luo, Xiangang.(2014).Off Axis Illumination Planar Hyperlens for Non-contacted Deep Subwavelength Demagnifying Lithography.PLASMONICS,9(6),1333-1339.
MLA Zhang, Wei,et al."Off Axis Illumination Planar Hyperlens for Non-contacted Deep Subwavelength Demagnifying Lithography".PLASMONICS 9.6(2014):1333-1339.

入库方式: OAI收割

来源:光电技术研究所

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