Off Axis Illumination Planar Hyperlens for Non-contacted Deep Subwavelength Demagnifying Lithography
文献类型：期刊论文
| 作者 | Zhang, Wei; Yao, Na; Wang, Changtao; Zhao, Zeyu; Wang, Yanqin; Gao, Ping; Luo, Xiangang |
| 刊名 | PLASMONICS
 |
| 出版日期 | 2014-12-01 |
| 卷号 | 9期号:6页码:1333-1339 |
| 关键词 | Nanolithography Surface plasmon Illumination design |
| 英文摘要 | Off axis illumination (OAI) technique combined with planar hyperlens is applied to achieve the non-contacted deep subwavelength demagnifying lithography. The designed OAI is confirmed to shift the spatial spectra of mask, leading to enhancement of the featured wavevectors components. On the other hand, the reflection effect of Ag cladding is necessary to obtain high contrast and high fidelity of nanopattern lithography. It is numerically demonstrated that the half-pitch resolution 32 nm with OAI (NA = 1.37) is obtained under 80 nm air working distance, which is about six times than the case of the conventional configuration under normal illumination (NA = 0). Further simulations show that the minimum half-pitch resolution of the planar hyperlens with OAI could reach 18 nm (similar to lambda/20). |
| WOS标题词 | Science & Technology ; Physical Sciences ; Technology |
| 类目[WOS] | Chemistry, Physical ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary |
| 研究领域[WOS] | Chemistry ; Science & Technology - Other Topics ; Materials Science |
| 关键词[WOS] | DIFFRACTION LIMIT ; SILVER SUPERLENS ; PERFECT LENS ; PHOTOLITHOGRAPHY |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000345146800010 |
| 公开日期 | 2015-12-24 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/2438]  |
| 专题 | 光电技术研究所_光电技术研究所被WoS收录文章 |
| 作者单位 | Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Nanofabricat & Microeng, Chengdu 610209, Peoples R China |
| 推荐引用方式 GB/T 7714 | Zhang, Wei,Yao, Na,Wang, Changtao,et al. Off Axis Illumination Planar Hyperlens for Non-contacted Deep Subwavelength Demagnifying Lithography[J]. PLASMONICS,2014,9(6):1333-1339. |
| APA | Zhang, Wei.,Yao, Na.,Wang, Changtao.,Zhao, Zeyu.,Wang, Yanqin.,...&Luo, Xiangang.(2014).Off Axis Illumination Planar Hyperlens for Non-contacted Deep Subwavelength Demagnifying Lithography.PLASMONICS,9(6),1333-1339. |
| MLA | Zhang, Wei,et al."Off Axis Illumination Planar Hyperlens for Non-contacted Deep Subwavelength Demagnifying Lithography".PLASMONICS 9.6(2014):1333-1339. |
入库方式： OAI收割
来源：光电技术研究所
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