A modified alignment method based on four-quadrant-grating moire for proximity lithography
文献类型：期刊论文
| 作者 | Di, Chengliang1,2; Zhu, Jiangping1,2,3; Yan, Wei1; Hu, Song1 |
| 刊名 | OPTIK
 |
| 出版日期 | 2014 |
| 卷号 | 125期号:17页码:4868-4872 |
| 关键词 | Coarse alignment Fine alignment Image processing Moire fringe |
| 英文摘要 | In this paper, we demonstrate a modified coarse-fine alignment scheme designed for proximity lithography. Both wafer alignment mark and mask alignment mark consists of linear grating arrays and "+" bar. Coarse alignment and fine alignment could work together to achieve the perfect alignment. Thereinto, coarse alignment, measured from two superposed "+" bars, guarantees the misalignment across wafer and mask within the measurement range of fine alignment, which is based on moire fringes formed by the superposition of linear grating arrays. Then we conduct the experiments using a nanometer actuator to drive the wafer alignment mark meanwhile keeping the mask alignment mark motionless, which validates the feasibility and rationality of our designed scheme. (C) 2014 Elsevier GmbH. All rights reserved. |
| WOS标题词 | Science & Technology ; Physical Sciences |
| 类目[WOS] | Optics |
| 研究领域[WOS] | Optics |
| 关键词[WOS] | X-RAY-LITHOGRAPHY ; PLATE-ARRAY LITHOGRAPHY ; FRINGE ; GRATINGS ; SYSTEM |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000341897100061 |
| 公开日期 | 2015-12-24 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/2443]  |
| 专题 | 光电技术研究所_光电技术研究所被WoS收录文章 |
| 作者单位 | 1.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China 2.Univ Chinese Acad Sci, Beijing 100039, Peoples R China 3.Univ Elect Sci & Technol China, Sch Optoelect Informat, Chengdu 610054, Peoples R China |
| 推荐引用方式 GB/T 7714 | Di, Chengliang,Zhu, Jiangping,Yan, Wei,et al. A modified alignment method based on four-quadrant-grating moire for proximity lithography[J]. OPTIK,2014,125(17):4868-4872. |
| APA | Di, Chengliang,Zhu, Jiangping,Yan, Wei,&Hu, Song.(2014).A modified alignment method based on four-quadrant-grating moire for proximity lithography.OPTIK,125(17),4868-4872. |
| MLA | Di, Chengliang,et al."A modified alignment method based on four-quadrant-grating moire for proximity lithography".OPTIK 125.17(2014):4868-4872. |
入库方式： OAI收割
来源：光电技术研究所
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