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Design and fabrication of broadband ultralow reflectivity black Si surfaces by laser micro/nanoprocessing

文献类型:期刊论文

作者Yang, Jing1,2,3; Luo, Fangfang1; Kao, Tsung Sheng1; Li, Xiong4; Ho, Ghim Wei1; Teng, Jinghua2; Luo, Xiangang4; Hong, Minghui1
刊名LIGHT-SCIENCE & APPLICATIONS
出版日期2014-07-01
卷号3
关键词anti-reflection broadband laser micro/nanoprocessing surface plasmons
英文摘要Light collection efficiency is an important factor that affects the performance of many optical and optoelectronic devices. In these devices, the high reflectivity of interfaces can hinder efficient light collection. To minimize unwanted reflection, anti-reflection surfaces can be fabricated by micro/nanopatterning. In this paper, we investigate the fabrication of broadband anti-reflection Si surfaces by laser micro/nanoprocessing. Laser direct writing is applied to create microstructures on Si surfaces that reduce light reflection by light trapping. In addition, laser interference lithography and metal assisted chemical etching are adopted to fabricate the Si nanowire arrays. The anti-reflection performance is greatly improved by the high aspect ratio subwavelength structures, which create gradients of refractive index from the ambient air to the substrate. Furthermore, by decoration of the Si nanowires with metallic nanoparticles, surface plasmon resonance can be used to further control the broadband reflections, reducing the reflection to below 1.0% across from 300 to 1200 nm. An average reflection of 0.8% is achieved.
WOS标题词Science & Technology ; Physical Sciences
类目[WOS]Optics
研究领域[WOS]Optics
关键词[WOS]SILICON NANOWIRE ARRAYS ; SOLAR-CELLS ; ANTIREFLECTION PROPERTIES ; NANOPARTICLES ; SUBWAVELENGTH ; ENHANCEMENT ; PERFORMANCE ; THIN ; AG
收录类别SCI
语种英语
WOS记录号WOS:000345187300001
公开日期2015-12-24
源URL[http://ir.ioe.ac.cn/handle/181551/2457]  
专题光电技术研究所_光电技术研究所被WoS收录文章
作者单位1.Natl Univ Singapore, Dept Elect & Comp Engn, Singapore 117576, Singapore
2.Agcy Sci Technol & Res, Inst Mat Res & Engn, Singapore 117602, Singapore
3.Natl Univ Singapore, NUS Environm Res Inst, Singapore 117411, Singapore
4.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China
推荐引用方式
GB/T 7714
Yang, Jing,Luo, Fangfang,Kao, Tsung Sheng,et al. Design and fabrication of broadband ultralow reflectivity black Si surfaces by laser micro/nanoprocessing[J]. LIGHT-SCIENCE & APPLICATIONS,2014,3.
APA Yang, Jing.,Luo, Fangfang.,Kao, Tsung Sheng.,Li, Xiong.,Ho, Ghim Wei.,...&Hong, Minghui.(2014).Design and fabrication of broadband ultralow reflectivity black Si surfaces by laser micro/nanoprocessing.LIGHT-SCIENCE & APPLICATIONS,3.
MLA Yang, Jing,et al."Design and fabrication of broadband ultralow reflectivity black Si surfaces by laser micro/nanoprocessing".LIGHT-SCIENCE & APPLICATIONS 3(2014).

入库方式: OAI收割

来源:光电技术研究所

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