中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Study of the influence of the shape of projection lens focal plane on the focus control of advanced lithography

文献类型:期刊论文

作者Li, Jinlong; Hu, Song; Zhao, Lixin
刊名OPTIK
出版日期2014
卷号125期号:22页码:6775-6777
关键词Focal plane PGFM Focus control Lithography
英文摘要The high-precision focus control technology becomes more and more important, as the effective depth of focus (DOF) shortens dramatically in advanced lithography. In conventional focus control technology, the focal plane of projection lens is assumed as an ideal plane, but in fact it is a curved surface. The difference between the ideal plane assumed and its real shape results in partial defocus of wafer exposure field, thereby affecting the exposure quality. In our current work, the real shape of projection lens focal plane is brought into consideration for the focus control, and the simulation shows that this method can effectively improve the accuracy of focus control by 26%. (C) 2014 Elsevier GmbH. All rights reserved.
WOS标题词Science & Technology ; Physical Sciences
类目[WOS]Optics
研究领域[WOS]Optics
关键词[WOS]SCANNERS
收录类别SCI
语种英语
WOS记录号WOS:000344976300035
公开日期2015-12-24
源URL[http://ir.ioe.ac.cn/handle/181551/2522]  
专题光电技术研究所_光电技术研究所被WoS收录文章
作者单位Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Sichuan, Peoples R China
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GB/T 7714
Li, Jinlong,Hu, Song,Zhao, Lixin. Study of the influence of the shape of projection lens focal plane on the focus control of advanced lithography[J]. OPTIK,2014,125(22):6775-6777.
APA Li, Jinlong,Hu, Song,&Zhao, Lixin.(2014).Study of the influence of the shape of projection lens focal plane on the focus control of advanced lithography.OPTIK,125(22),6775-6777.
MLA Li, Jinlong,et al."Study of the influence of the shape of projection lens focal plane on the focus control of advanced lithography".OPTIK 125.22(2014):6775-6777.

入库方式: OAI收割

来源:光电技术研究所

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