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Gap-optimized Moire phase imaging alignment for proximity lithography

文献类型：期刊论文

作者Zhu, Jiangping1; Hu, Song2; You, Zhisheng1; Su, Xianyu3
刊名OPTICAL ENGINEERING
出版日期2015
卷号54期号:1
关键词lithography alignment Moire techniques
英文摘要The proposed four-quadrant Moire alignment scheme to detect the misalignment between mask and wafer for proximity lithography can achieve the alignment accuracy with nanometer level. When implementing the scheme, however, the distribution of Moire fringes associated with the mask-wafer gap indeed goes against the alignment, making the gap optimization highly urgent. The optimization model is established, and numerical simulation as well as experimental verification is also provided. Furthermore, an alignment accuracy of similar to 3 nm with the illumination wavelength of 632.8 nm is experimentally attained. Simultaneously, the design mechanism of alignment marks for improving the availability of the alignment scheme is discussed. (C) 2015 Society of Photo-Optical Instrumentation Engineers (SPIE)
WOS标题词Science & Technology ; Physical Sciences
类目[WOS]Optics
研究领域[WOS]Optics
关键词[WOS]FRINGE ; GRATINGS
收录类别SCI
语种英语
WOS记录号WOS:000349442900047
公开日期2015-12-24
源URL[http://ir.ioe.ac.cn/handle/181551/2531]  
专题光电技术研究所_光电技术研究所被WoS收录文章
作者单位1.Sichuan Univ, Sch Comp Sci & Technol, Chengdu 610064, Peoples R China
2.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China
3.Sichuan Univ, Sch Elect & Informat, Chengdu 610064, Peoples R China
推荐引用方式
GB/T 7714		 Zhu, Jiangping,Hu, Song,You, Zhisheng,et al. Gap-optimized Moire phase imaging alignment for proximity lithography[J]. OPTICAL ENGINEERING,2015,54(1).
APA Zhu, Jiangping,Hu, Song,You, Zhisheng,&Su, Xianyu.(2015).Gap-optimized Moire phase imaging alignment for proximity lithography.OPTICAL ENGINEERING,54(1).
MLA Zhu, Jiangping,et al."Gap-optimized Moire phase imaging alignment for proximity lithography".OPTICAL ENGINEERING 54.1(2015).

入库方式： OAI收割

来源：光电技术研究所

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