One exposure processing to fabricate spiral phase plate with continuous surface
文献类型：期刊论文
| 作者 | Shi, Lifang1; Zhang, Zhiyou2; Cao, Axiu1; Luo, Xue1; Deng, Qiling1 |
| 刊名 | OPTICS EXPRESS
 |
| 出版日期 | 2015-04-06 |
| 卷号 | 23期号:7页码:8620-8629 |
| 英文摘要 | An economical method for fabricating spiral phase plate (SPP) with continuous surface is proposed in this paper. We use an interval to quantize a three dimensional surface of an SPP into two dimensional bars to form a binary mask. The exposure dose can be precisely distributed through this mask in the exposure process. We discuss the select criterion of the quantization interval and the fabricating processes of SPP in detail. In the results, we present the fabrication of four kinds of high quality SPPs with different topological charges. The morphology analysis and the corresponding optical measurements verify the reliability of our fabrication method. (C)2015 Optical Society of America |
| WOS标题词 | Science & Technology ; Physical Sciences |
| 类目[WOS] | Optics |
| 研究领域[WOS] | Optics |
| 关键词[WOS] | ORBITAL ANGULAR-MOMENTUM ; VARIANT SUBWAVELENGTH GRATINGS ; MICROLENS ARRAY ; INTERFERENCE ; PROFILE ; STATES ; LIGHT |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000352290000065 |
| 公开日期 | 2015-12-24 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/2548]  |
| 专题 | 光电技术研究所_光电技术研究所被WoS收录文章 |
| 作者单位 | 1.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Sichuan, Peoples R China 2.Sichuan Univ, Minist Educ, Key Lab High Energy Dens Phys & Technol, Chengdu 610064, Sichuan, Peoples R China |
| 推荐引用方式 GB/T 7714 | Shi, Lifang,Zhang, Zhiyou,Cao, Axiu,et al. One exposure processing to fabricate spiral phase plate with continuous surface[J]. OPTICS EXPRESS,2015,23(7):8620-8629. |
| APA | Shi, Lifang,Zhang, Zhiyou,Cao, Axiu,Luo, Xue,&Deng, Qiling.(2015).One exposure processing to fabricate spiral phase plate with continuous surface.OPTICS EXPRESS,23(7),8620-8629. |
| MLA | Shi, Lifang,et al."One exposure processing to fabricate spiral phase plate with continuous surface".OPTICS EXPRESS 23.7(2015):8620-8629. |
入库方式： OAI收割
来源：光电技术研究所
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