The theoretic analysis of maskless surface plasmon resonant interference lithography by prism coupling
文献类型：期刊论文
| 作者 | Fang Liang1; Du Jing-Lei1; Guo Xiao-Wei1; Wang Jing-Quan1; Zhang Zhi-You1; Luo Xian-Gang2; Du Chun-Lei2 |
| 刊名 | CHINESE PHYSICS B
 |
| 出版日期 | 2008-07-01 |
| 卷号 | 17期号:7页码:2499-2503 |
| 关键词 | surface plasmon polaritons (SPPs) enhancement interference lithography resolution |
| 英文摘要 | The use of an attenuated total reflect ion-coup ling mode of prism coated with metal film to excite the interference of the surface plasmon polaritons (SPPs) was proposed for periodic patterning with a resolution of subwavelength scale. High intensity of electric field can be obtained because of the coupling between SPPs and evanescence under a resonance condition, which can reduce exposure time and improve contrast. In this paper, several critical parameters for maskless surface plasmon resonant lithography are described, and the preliminary simulation based on a finite difference time-domain technique agrees well with the theoretical analysis, which demonstrates this scheme and provides the theoretical basis for further experiments. |
| WOS标题词 | Science & Technology ; Physical Sciences |
| 类目[WOS] | Physics, Multidisciplinary |
| 研究领域[WOS] | Physics |
| 关键词[WOS] | OPTICAL LITHOGRAPHY |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000257843000025 |
| 公开日期 | 2015-12-24 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/3236]  |
| 专题 | 光电技术研究所_光电技术研究所被WoS收录文章 |
| 作者单位 | 1.Sichuan Univ, Dept Phys, Chengdu 610064, Peoples R China 2.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China |
| 推荐引用方式 GB/T 7714 | Fang Liang,Du Jing-Lei,Guo Xiao-Wei,et al. The theoretic analysis of maskless surface plasmon resonant interference lithography by prism coupling[J]. CHINESE PHYSICS B,2008,17(7):2499-2503. |
| APA | Fang Liang.,Du Jing-Lei.,Guo Xiao-Wei.,Wang Jing-Quan.,Zhang Zhi-You.,...&Du Chun-Lei.(2008).The theoretic analysis of maskless surface plasmon resonant interference lithography by prism coupling.CHINESE PHYSICS B,17(7),2499-2503. |
| MLA | Fang Liang,et al."The theoretic analysis of maskless surface plasmon resonant interference lithography by prism coupling".CHINESE PHYSICS B 17.7(2008):2499-2503. |
入库方式： OAI收割
来源：光电技术研究所
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