Fabrication of Nanoscale Line Width Using the Improved Optical Maskless Lithographic System
文献类型：期刊论文
| 作者 | Jiang, Wenbo1,2; Hu, Song1; Zhao, Lixin1; Yan, Wei1; Yang, Yong1,2; Zhou, Shaolin1,2; Chen, Wangfu1,2 |
| 刊名 | JOURNAL OF COMPUTATIONAL AND THEORETICAL NANOSCIENCE
 |
| 出版日期 | 2009-05-01 |
| 卷号 | 6期号:5页码:1170-1174 |
| 关键词 | Maskless Lithography Key Techniques Lithographic Experiment Nanoscale |
| 英文摘要 | In this paper, we present a novel optical maskless lithographic system. Compared with conventional optical maskless lithographic system, there are three key techniques in our system. They are illuminating system, focusing system, precise position work-stage system. We introduce and analyze three systems in this paper respectively. Through theoretic analysis and optical lithographic experiment, the results show that it provides a direction of optical lithographic technology with higher resolution and lower cost. By proper design the structure of the whole system and melioration on diffractive element, better resolution can be realized. It will be used to fabricate the nanoscale line width in the near future after further meliorations. |
| WOS标题词 | Science & Technology ; Physical Sciences ; Technology |
| 类目[WOS] | Chemistry, Multidisciplinary ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied ; Physics, Condensed Matter |
| 研究领域[WOS] | Chemistry ; Science & Technology - Other Topics ; Materials Science ; Physics |
| 关键词[WOS] | ELECTRON-BEAM LITHOGRAPHY ; PHOTON-SIEVE |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000265745000031 |
| 公开日期 | 2015-12-24 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/3283]  |
| 专题 | 光电技术研究所_光电技术研究所被WoS收录文章 |
| 作者单位 | 1.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China 2.Chinese Acad Sci, Grad Sch, Beijing 100039, Peoples R China |
| 推荐引用方式 GB/T 7714 | Jiang, Wenbo,Hu, Song,Zhao, Lixin,et al. Fabrication of Nanoscale Line Width Using the Improved Optical Maskless Lithographic System[J]. JOURNAL OF COMPUTATIONAL AND THEORETICAL NANOSCIENCE,2009,6(5):1170-1174. |
| APA | Jiang, Wenbo.,Hu, Song.,Zhao, Lixin.,Yan, Wei.,Yang, Yong.,...&Chen, Wangfu.(2009).Fabrication of Nanoscale Line Width Using the Improved Optical Maskless Lithographic System.JOURNAL OF COMPUTATIONAL AND THEORETICAL NANOSCIENCE,6(5),1170-1174. |
| MLA | Jiang, Wenbo,et al."Fabrication of Nanoscale Line Width Using the Improved Optical Maskless Lithographic System".JOURNAL OF COMPUTATIONAL AND THEORETICAL NANOSCIENCE 6.5(2009):1170-1174. |
入库方式： OAI收割
来源：光电技术研究所
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