A practical nanofabrication method: surface plasmon polaritons interference lithography based on backside-exposure technique
文献类型：期刊论文
| 作者 | He, Mingyang1,2; Zhang, Zhiyou1,2; Shi, Sha1,2; Du, Jinglei1,2; Li, Xupeng1,2; Li, Shuhong1,2; Ma, Wenying3 |
| 刊名 | OPTICS EXPRESS
 |
| 出版日期 | 2010-07-19 |
| 卷号 | 18期号:15页码:15975-15980 |
| 英文摘要 | For the experiments of surface plasmon polaritons (SPPs) interference lithography based on attenuated total reflection-coupling mode to be done conveniently, we introduce a backside-exposure technique in this paper. The physical mechanisms of SPPs interference with the backside-exposure method are studied and the interference fringes with feature size below 65nm are experimentally obtained. The technique can be used to fabricate nanostructures conveniently with large area, and avoids the difficulties for seeking high refractive prism and matching fluid. (C) 2010 Optical Society of America |
| WOS标题词 | Science & Technology ; Physical Sciences |
| 类目[WOS] | Optics |
| 研究领域[WOS] | Optics |
| 关键词[WOS] | SOLID IMMERSION LENS ; EVANESCENT WAVES ; ASSISTED NANOLITHOGRAPHY ; BEAM LITHOGRAPHY ; FEATURES |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000280693300077 |
| 公开日期 | 2015-12-24 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/3343]  |
| 专题 | 光电技术研究所_光电技术研究所被WoS收录文章 |
| 作者单位 | 1.Sichuan Univ, Inst Nanophoton Technol, Sch Phys Sci & Technol, Chengdu 610064, Peoples R China 2.Sichuan Univ, Key Lab High Energy Dens Phys, Educ Minist, Sch Phys Sci & Technol, Chengdu 610064, Peoples R China 3.Inst Opt & Elect, Chengdu 610209, Peoples R China |
| 推荐引用方式 GB/T 7714 | He, Mingyang,Zhang, Zhiyou,Shi, Sha,et al. A practical nanofabrication method: surface plasmon polaritons interference lithography based on backside-exposure technique[J]. OPTICS EXPRESS,2010,18(15):15975-15980. |
| APA | He, Mingyang.,Zhang, Zhiyou.,Shi, Sha.,Du, Jinglei.,Li, Xupeng.,...&Ma, Wenying.(2010).A practical nanofabrication method: surface plasmon polaritons interference lithography based on backside-exposure technique.OPTICS EXPRESS,18(15),15975-15980. |
| MLA | He, Mingyang,et al."A practical nanofabrication method: surface plasmon polaritons interference lithography based on backside-exposure technique".OPTICS EXPRESS 18.15(2010):15975-15980. |
入库方式： OAI收割
来源：光电技术研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。