中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Design and application of phase photon sieve

文献类型:期刊论文

作者Jiang, Wenbo1,2; Hu, Song1; Zhao, Lixin1; Yan, Wei1; Yang, Yong1,2
刊名OPTIK
出版日期2010
卷号121期号:7页码:637-640
关键词Imaging principle Phase photon sieve Design and fabrication Nano-lithography experiment system
英文摘要The imaging principle of Fresnel zone plate and photon sieve were analyzed in this paper. The design and fabrication of phase photon sieve were discussed. The feasibility of using phase photon sieve to realize nano-lithography was analyzed, a novel lithography experiment system based on phase photon sieve was presented, which not only has higher resolution and image contrast than the Fresnel zone plate lithography but also have higher diffractive efficiency than the amplitude photon sieve lithography. (C) 2009 Elsevier GmbH. All rights reserved.
WOS标题词Science & Technology ; Physical Sciences
类目[WOS]Optics
研究领域[WOS]Optics
关键词[WOS]FRACTAL ZONE PLATES ; LITHOGRAPHY
收录类别SCI
语种英语
WOS记录号WOS:000276613200009
公开日期2015-12-24
源URL[http://ir.ioe.ac.cn/handle/181551/3348]  
专题光电技术研究所_光电技术研究所被WoS收录文章
作者单位1.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China
2.Chinese Acad Sci, Grad Sch, Beijing 100039, Peoples R China
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GB/T 7714
Jiang, Wenbo,Hu, Song,Zhao, Lixin,et al. Design and application of phase photon sieve[J]. OPTIK,2010,121(7):637-640.
APA Jiang, Wenbo,Hu, Song,Zhao, Lixin,Yan, Wei,&Yang, Yong.(2010).Design and application of phase photon sieve.OPTIK,121(7),637-640.
MLA Jiang, Wenbo,et al."Design and application of phase photon sieve".OPTIK 121.7(2010):637-640.

入库方式: OAI收割

来源:光电技术研究所

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