中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
A quick algorithm of exposure distribution for fabrication of micro-optical structures

文献类型:期刊论文

作者Li, Shuhong2; Du, Chunlei2; Fu, Yongqi1
刊名OPTIK
出版日期2010
卷号121期号:11页码:988-992
关键词Microstructure fabrication Lenses Microlithography
英文摘要An approximate algorithm of exposure distribution on photoresist for the case of large exposure dose is obtained on the basis of the algorithm reported in [X. Dong, C. Du, S. Li, C. Wang, Y. Fu, Control approach for form accuracy of microlenses with continuous relief, Opt. Express 13 (2005) 1353-1360] via analyzing a PAC concentration distribution inside the photoresist. We analyzed the fabrication errors of the micro-optical structures which are caused by the approximate algorithm. The relief form error originating from the measurement errors of characteristics parameters of the photoresist is analyzed as well. A valid approach for a quick and accurate design of the exposure distribution is provided accordingly. As an example, a saw-tooth grating with 75 mu m relief depth was designed and fabricated so as to verify the new algorithm. Our measurement results show that root mean square (rms) value is less than 0.81 mu m. The quick algorithm can satisfy the requirements of micro-optical systems for practical applications. (C) 2009 Elsevier GmbH. All rights reserved.
WOS标题词Science & Technology ; Physical Sciences
类目[WOS]Optics
研究领域[WOS]Optics
关键词[WOS]PHOTORESIST DISSOLUTION ; LITHOGRAPHY SIMULATION ; PARAMETER MEASUREMENTS ; MODEL
收录类别SCI
语种英语
WOS记录号WOS:000279003000006
公开日期2015-12-24
源URL[http://ir.ioe.ac.cn/handle/181551/3355]  
专题光电技术研究所_光电技术研究所被WoS收录文章
作者单位1.Univ Elect Sci & Technol China, Sch Phys Elect, Chengdu 610054, Sichuan, Peoples R China
2.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 10209, Sichuan, Peoples R China
推荐引用方式
GB/T 7714
Li, Shuhong,Du, Chunlei,Fu, Yongqi. A quick algorithm of exposure distribution for fabrication of micro-optical structures[J]. OPTIK,2010,121(11):988-992.
APA Li, Shuhong,Du, Chunlei,&Fu, Yongqi.(2010).A quick algorithm of exposure distribution for fabrication of micro-optical structures.OPTIK,121(11),988-992.
MLA Li, Shuhong,et al."A quick algorithm of exposure distribution for fabrication of micro-optical structures".OPTIK 121.11(2010):988-992.

入库方式: OAI收割

来源:光电技术研究所

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