A quick algorithm of exposure distribution for fabrication of micro-optical structures
文献类型:期刊论文
作者 | Li, Shuhong2; Du, Chunlei2; Fu, Yongqi1 |
刊名 | OPTIK
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出版日期 | 2010 |
卷号 | 121期号:11页码:988-992 |
关键词 | Microstructure fabrication Lenses Microlithography |
英文摘要 | An approximate algorithm of exposure distribution on photoresist for the case of large exposure dose is obtained on the basis of the algorithm reported in [X. Dong, C. Du, S. Li, C. Wang, Y. Fu, Control approach for form accuracy of microlenses with continuous relief, Opt. Express 13 (2005) 1353-1360] via analyzing a PAC concentration distribution inside the photoresist. We analyzed the fabrication errors of the micro-optical structures which are caused by the approximate algorithm. The relief form error originating from the measurement errors of characteristics parameters of the photoresist is analyzed as well. A valid approach for a quick and accurate design of the exposure distribution is provided accordingly. As an example, a saw-tooth grating with 75 mu m relief depth was designed and fabricated so as to verify the new algorithm. Our measurement results show that root mean square (rms) value is less than 0.81 mu m. The quick algorithm can satisfy the requirements of micro-optical systems for practical applications. (C) 2009 Elsevier GmbH. All rights reserved. |
WOS标题词 | Science & Technology ; Physical Sciences |
类目[WOS] | Optics |
研究领域[WOS] | Optics |
关键词[WOS] | PHOTORESIST DISSOLUTION ; LITHOGRAPHY SIMULATION ; PARAMETER MEASUREMENTS ; MODEL |
收录类别 | SCI |
语种 | 英语 |
WOS记录号 | WOS:000279003000006 |
公开日期 | 2015-12-24 |
源URL | [http://ir.ioe.ac.cn/handle/181551/3355] ![]() |
专题 | 光电技术研究所_光电技术研究所被WoS收录文章 |
作者单位 | 1.Univ Elect Sci & Technol China, Sch Phys Elect, Chengdu 610054, Sichuan, Peoples R China 2.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 10209, Sichuan, Peoples R China |
推荐引用方式 GB/T 7714 | Li, Shuhong,Du, Chunlei,Fu, Yongqi. A quick algorithm of exposure distribution for fabrication of micro-optical structures[J]. OPTIK,2010,121(11):988-992. |
APA | Li, Shuhong,Du, Chunlei,&Fu, Yongqi.(2010).A quick algorithm of exposure distribution for fabrication of micro-optical structures.OPTIK,121(11),988-992. |
MLA | Li, Shuhong,et al."A quick algorithm of exposure distribution for fabrication of micro-optical structures".OPTIK 121.11(2010):988-992. |
入库方式: OAI收割
来源:光电技术研究所
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