Nano-photomask fabrication using focused ion beam direct writing
文献类型：期刊论文
| 作者 | Fang, F. Z.1,2; Xu, Z. W.1,2; Hu, X. T.1; Wang, C. T.3; Luo, X. G.3; Fu, Y. Q.4 |
| 刊名 | CIRP ANNALS-MANUFACTURING TECHNOLOGY
 |
| 出版日期 | 2010 |
| 卷号 | 59期号:1页码:543-546 |
| 关键词 | Ion beam machining (IBM) Nano-manufacturing Photomask |
| 英文摘要 | A novel nano-photomask fabrication method using focused ion beam direct writing (FIBDW) is proposed to normalize the dwell time of each pixel of the ion beam location with respect to the contrast of designed bitmaps. The removal mechanism is studied to develop the fabrication process. It has been confirmed that beam dwell time, astigmation and overlap are the most effective parameters for achieving the features in nanoscale. An approach for dot array milling is proposed also for inspecting and correcting the beam astigmatism. Photomasks with line width of 32 nm are employed for the purpose of successful application of this novel method in this study. (C) 2010 CIRP. |
| WOS标题词 | Science & Technology ; Technology |
| 类目[WOS] | Engineering, Industrial ; Engineering, Manufacturing |
| 研究领域[WOS] | Engineering |
| 关键词[WOS] | TECHNOLOGY |
| 收录类别 | SCI ; ISTP |
| 语种 | 英语 |
| WOS记录号 | WOS:000280115100131 |
| 公开日期 | 2015-12-24 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/3404]  |
| 专题 | 光电技术研究所_光电技术研究所被WoS收录文章 |
| 作者单位 | 1.Tianjin Univ, State Key Lab Precis Measuring Technol & Instrume, Ctr MicroNano Mfg Technol, Tianjin 300072, Peoples R China 2.Tianjin MicroNano Mfg Tech Co Ltd, Tianjin, Peoples R China 3.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Beijing 100864, Peoples R China 4.Univ Elect Sci & Technol China, Sch Phys Elect, Chengdu 610054, Peoples R China |
| 推荐引用方式 GB/T 7714 | Fang, F. Z.,Xu, Z. W.,Hu, X. T.,et al. Nano-photomask fabrication using focused ion beam direct writing[J]. CIRP ANNALS-MANUFACTURING TECHNOLOGY,2010,59(1):543-546. |
| APA | Fang, F. Z.,Xu, Z. W.,Hu, X. T.,Wang, C. T.,Luo, X. G.,&Fu, Y. Q..(2010).Nano-photomask fabrication using focused ion beam direct writing.CIRP ANNALS-MANUFACTURING TECHNOLOGY,59(1),543-546. |
| MLA | Fang, F. Z.,et al."Nano-photomask fabrication using focused ion beam direct writing".CIRP ANNALS-MANUFACTURING TECHNOLOGY 59.1(2010):543-546. |
入库方式： OAI收割
来源：光电技术研究所
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