Improving resolution of superlens lithography by phase-shifting mask
文献类型：期刊论文
| 作者 | Yao, Na; Lai, Zian; Fang, Liang; Wang, Changtao; Feng, Qin; Zhao, Zheyu; Luo, Xiangang |
| 刊名 | OPTICS EXPRESS
 |
| 出版日期 | 2011-08-15 |
| 卷号 | 19期号:17页码:15982-15989 |
| 英文摘要 | We propose to apply phase-shifting mask (PSM) to superlens lithography to improve its resolution. The PSM comprises of chromium slits alternatively filled by Ag and PMMA. The pi-phase shift is induced whereas their transmittance of electric intensity is almost equal for two neighboring slits. The destructive interference between two slits has greatly improved the spatial resolution and image fidelity. For representative configurations of superlens lithography, FDTD numerical simulations demonstrate that two slits with center-to-center distance d = 35 nm (similar to lambda/10) can be resolved in PSM design, compared to 60 nm (similar to lambda/6) without the PSM. (C)2011 Optical Society of America |
| WOS标题词 | Science & Technology ; Physical Sciences |
| 类目[WOS] | Optics |
| 研究领域[WOS] | Optics |
| 关键词[WOS] | SILVER SUPERLENS ; NEAR-FIELD ; DESIGN ; SLAB |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000293894900036 |
| 公开日期 | 2015-12-24 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/3435]  |
| 专题 | 光电技术研究所_光电技术研究所被WoS收录文章 |
| 作者单位 | Chinese Acad Sci, State Key Lab Opt Technol Microfabricat, Inst Opt & Elect, Chengdu 610209, Peoples R China |
| 推荐引用方式 GB/T 7714 | Yao, Na,Lai, Zian,Fang, Liang,et al. Improving resolution of superlens lithography by phase-shifting mask[J]. OPTICS EXPRESS,2011,19(17):15982-15989. |
| APA | Yao, Na.,Lai, Zian.,Fang, Liang.,Wang, Changtao.,Feng, Qin.,...&Luo, Xiangang.(2011).Improving resolution of superlens lithography by phase-shifting mask.OPTICS EXPRESS,19(17),15982-15989. |
| MLA | Yao, Na,et al."Improving resolution of superlens lithography by phase-shifting mask".OPTICS EXPRESS 19.17(2011):15982-15989. |
入库方式： OAI收割
来源：光电技术研究所
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