中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Fringe pattern analysis for optical alignment in nanolithography using two-dimentional Fourier transform

文献类型:期刊论文

作者Xu, Feng1; Song, Hu; Zhou, Shaolin
刊名OPTICAL ENGINEERING
出版日期2011-08-01
卷号50期号:8
关键词nanolithography alignment fringe pattern analysis two-dimensional Fourier transform phase extraction
英文摘要A simple but effective phase analysis method for the fringe pattern that occurs in two superposed grating marks applied in the previously designed dual-grating-based alignment scheme for lithography is proposed. First, the fringe pattern is processed and analyzed using a frequency domain method based on two-dimensional (2D) Fourier transform, and the 2D notch filter is appropriately designed to select the useful spectrum to obtain the target phase information. Further, phase difference of two sets of fringes is computed to acquire the alignment offset. Numerical simulation and experiment are both performed to verify this method. Finally, certain analysis about the error of phase difference extraction in the fringe pattern and precision of alignment are also presented. The results indicate that the background and noise of the fringe pattern can be efficiently filtered and target phase information can be extracted with high accuracy through this method. (C) 2011 Society of Photo-Optical Instrumentation Engineers (SPIE). [DOI: 10.1117/1.3609007]
WOS标题词Science & Technology ; Physical Sciences
类目[WOS]Optics
研究领域[WOS]Optics
关键词[WOS]X-RAY-LITHOGRAPHY ; MOIRE FRINGE ; SYSTEM
收录类别SCI
语种英语
WOS记录号WOS:000294306500050
公开日期2015-12-24
源URL[http://ir.ioe.ac.cn/handle/181551/3442]  
专题光电技术研究所_光电技术研究所被WoS收录文章
作者单位1.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China
2.Chinese Acad Sci, Grad Univ, Beijing 100039, Peoples R China
推荐引用方式
GB/T 7714
Xu, Feng,Song, Hu,Zhou, Shaolin. Fringe pattern analysis for optical alignment in nanolithography using two-dimentional Fourier transform[J]. OPTICAL ENGINEERING,2011,50(8).
APA Xu, Feng,Song, Hu,&Zhou, Shaolin.(2011).Fringe pattern analysis for optical alignment in nanolithography using two-dimentional Fourier transform.OPTICAL ENGINEERING,50(8).
MLA Xu, Feng,et al."Fringe pattern analysis for optical alignment in nanolithography using two-dimentional Fourier transform".OPTICAL ENGINEERING 50.8(2011).

入库方式: OAI收割

来源:光电技术研究所

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