Fabrication of submicron photon sieve using E-beam lithography and X-ray lithography
文献类型：期刊论文
| 作者 | Jiang, Wenbo1,2; Hu, Song3; Xie, Changqing4; Zhu, Xiaoli4; Zhao, Lixin3; Xie, Weicheng1,2; Wang, Jun1,2; Dong, Xiucheng1,2 |
| 刊名 | MICROELECTRONIC ENGINEERING
 |
| 出版日期 | 2011-10-01 |
| 卷号 | 88期号:10页码:3178-3181 |
| 关键词 | Submicron photon sieve E-beam lithography X-ray lithography Key technique Error analysis |
| 英文摘要 | In this paper, a new hybrid method to fabricate submicron photon sieve is proposed, where the E-beam lithography and the X-ray lithography are used. It is found that 2.81 mu m thickness of the polyimide film, 400 nm thickness of the ZEP-520 and 280 mu C/cm(2) exposure dose are good for E-beam lithography, while 500 nm thickness of the PMMA and 30 s developing time are good for X-ray lithography. We have successfully fabricated the photon sieve with these parameters (the diameter of photon sieve: 250 mu m, the focal length: 150 mu m, the diameter of the outmost pinhole: 420 nm). Some key techniques of this method are analyzed respectively, and the error analysis are done at the end of this paper. It provides a direction of nanoscale optical element fabrication with higher resolution and lower cost. (C) 2011 Elsevier B.V. All rights reserved. |
| WOS标题词 | Science & Technology ; Technology ; Physical Sciences |
| 类目[WOS] | Engineering, Electrical & Electronic ; Nanoscience & Nanotechnology ; Optics ; Physics, Applied |
| 研究领域[WOS] | Engineering ; Science & Technology - Other Topics ; Optics ; Physics |
| 关键词[WOS] | MODEL |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000297400900025 |
| 公开日期 | 2015-12-24 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/3457]  |
| 专题 | 光电技术研究所_光电技术研究所被WoS收录文章 |
| 作者单位 | 1.Xihua Univ, Sch Elect & Informat Engn, Chengdu 610039, Peoples R China 2.Xihua Univ, Key Lab Signal & Informat Proc Sichuan Prov, Chengdu 610039, Peoples R China 3.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China 4.Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China |
| 推荐引用方式 GB/T 7714 | Jiang, Wenbo,Hu, Song,Xie, Changqing,et al. Fabrication of submicron photon sieve using E-beam lithography and X-ray lithography[J]. MICROELECTRONIC ENGINEERING,2011,88(10):3178-3181. |
| APA | Jiang, Wenbo.,Hu, Song.,Xie, Changqing.,Zhu, Xiaoli.,Zhao, Lixin.,...&Dong, Xiucheng.(2011).Fabrication of submicron photon sieve using E-beam lithography and X-ray lithography.MICROELECTRONIC ENGINEERING,88(10),3178-3181. |
| MLA | Jiang, Wenbo,et al."Fabrication of submicron photon sieve using E-beam lithography and X-ray lithography".MICROELECTRONIC ENGINEERING 88.10(2011):3178-3181. |
入库方式： OAI收割
来源：光电技术研究所
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