Resolution and stability analysis of localized surface plasmon lithography on the geometrical parameters of soft mold
文献类型：期刊论文
| 作者 | Zhang, Yukun1,2; Du, Jinglei1; Wei, Xingzhan2; Shi, Lifang2; Deng, Qiling2; Dong, Xiaochun2; Du, Chunlei2 |
| 刊名 | APPLIED OPTICS
 |
| 出版日期 | 2011-05-01 |
| 卷号 | 50期号:13页码:1963-1967 |
| 英文摘要 | We have recently shown that patterns with 30 nm line width and micrometer scale periodicity could be steadily fabricated by employing localized surface plasmons lithography based on a soft mold [Opt. Lett. 35, 13 (2009)]. In this paper, the dependence of the resolution (pattern periodicity), critical dimension, and electric field intensity on the geometrical parameters of the soft mold, such as ridge width, mold periodicity, ridge depth, and slope, have been systematically studied and analyzed. The relevant simulation results by finite-difference time-domain demonstrate that the critical dimension exhibits a perfect stabilization and the value of electric field intensity would be especially large, when the ridge depth is in the range from 100 to 270 nm and the slope angle is below 35 degrees. Importantly, the optimal resolution and critical dimension can reach 100 and 17 nm, respectively, by reasonably designing the corresponding mold periodicity and ridge width, which indicates that the method is particularly suitable for obtaining patterns with high density and is extremely promising for bio-sensing and photonic crystals application. (C) 2011 Optical Society of America |
| WOS标题词 | Science & Technology ; Physical Sciences |
| 类目[WOS] | Optics |
| 研究领域[WOS] | Optics |
| 关键词[WOS] | ELECTRON-BEAM LITHOGRAPHY ; ACHROMATIC INTERFEROMETRIC LITHOGRAPHY ; NANOLITHOGRAPHY ; GRATINGS ; GRIDS ; METAL |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000290018700027 |
| 公开日期 | 2015-12-24 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/3465]  |
| 专题 | 光电技术研究所_光电技术研究所被WoS收录文章 |
| 作者单位 | 1.Sichuan Univ, Dept Phys, Chengdu 610064, Sichuan Prov, Peoples R China 2.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Sichuan Prov, Peoples R China |
| 推荐引用方式 GB/T 7714 | Zhang, Yukun,Du, Jinglei,Wei, Xingzhan,et al. Resolution and stability analysis of localized surface plasmon lithography on the geometrical parameters of soft mold[J]. APPLIED OPTICS,2011,50(13):1963-1967. |
| APA | Zhang, Yukun.,Du, Jinglei.,Wei, Xingzhan.,Shi, Lifang.,Deng, Qiling.,...&Du, Chunlei.(2011).Resolution and stability analysis of localized surface plasmon lithography on the geometrical parameters of soft mold.APPLIED OPTICS,50(13),1963-1967. |
| MLA | Zhang, Yukun,et al."Resolution and stability analysis of localized surface plasmon lithography on the geometrical parameters of soft mold".APPLIED OPTICS 50.13(2011):1963-1967. |
入库方式： OAI收割
来源：光电技术研究所
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