0.13 mu m photolithography using inverse Fourier transform convolution filtering
文献类型：期刊论文
| 作者 | Zhou, CX; Luo, XG; Feng, B |
| 刊名 | OPTICAL ENGINEERING
 |
| 出版日期 | 2000-11-01 |
| 卷号 | 39期号:11页码:2943-2946 |
| 关键词 | inverse Fourier transform convolution filtering pupil filtering wavefront engineering photolithography resolution |
| 英文摘要 | Discrete formulas to calculate aerial imaging on the wafer for photolithography are presented, and physical fundamental of inverse Fourier transform convolution filtering to improving resolution is discussed. The larger contrast for dense L/S group with the pitch of 0.27 mum is obtained with an ArF 193 nm stepper with a numerical aperture of 0.60 and partial coherent coefficients of 0.3. (C) 2000 Society of Photo-Optical Instrumentation Engineers. [S0091-3286(00)02010-9]. |
| WOS标题词 | Science & Technology ; Physical Sciences |
| 类目[WOS] | Optics |
| 研究领域[WOS] | Optics |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000165479400014 |
| 公开日期 | 2015-12-24 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/3481]  |
| 专题 | 光电技术研究所_光电技术研究所被WoS收录文章 |
| 作者单位 | Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China |
| 推荐引用方式 GB/T 7714 | Zhou, CX,Luo, XG,Feng, B. 0.13 mu m photolithography using inverse Fourier transform convolution filtering[J]. OPTICAL ENGINEERING,2000,39(11):2943-2946. |
| APA | Zhou, CX,Luo, XG,&Feng, B.(2000).0.13 mu m photolithography using inverse Fourier transform convolution filtering.OPTICAL ENGINEERING,39(11),2943-2946. |
| MLA | Zhou, CX,et al."0.13 mu m photolithography using inverse Fourier transform convolution filtering".OPTICAL ENGINEERING 39.11(2000):2943-2946. |
入库方式： OAI收割
来源：光电技术研究所
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