Fabrication error model and near field beam modulation analysis for phase step diffractive gratings
文献类型：期刊论文
| 作者 | Gao, FH; Cheng, Y; Tang, XG; Yao, J; Qiu, CK; Guo, YK |
| 刊名 | MICROELECTRONIC ENGINEERING
 |
| 出版日期 | 2005-03-01 |
| 卷号 | 78-79页码:142-146 |
| 关键词 | color separating grating beam modulation near field fabrication error model optical damage |
| 英文摘要 | The structure aberrations of color separating grating (CSG), which is caused by the fabrication process, generate great modulations to the laser beam when CSG is used in the final optical system of a high power laser system. The beam modulations may lead to severe optical damages to CSG itself and the system. In this paper, a comprehensive fabrication error model for CSG is developed to study the beam modulation characteristics in the near field. Through theoretical calculations and simulations, the near field diffraction pattern of CSG is obtained, and the relationship between beam modulations and CSG structural aberrations is presented. The results show that beam modulations are mainly caused by the stair depth error and the slope error. This study provides a convenient way to estimate the possibility of optical damages induced by CSG. (c) 2005 Published by Elsevier B.V. |
| WOS标题词 | Science & Technology ; Technology ; Physical Sciences |
| 类目[WOS] | Engineering, Electrical & Electronic ; Nanoscience & Nanotechnology ; Optics ; Physics, Applied |
| 研究领域[WOS] | Engineering ; Science & Technology - Other Topics ; Optics ; Physics |
| 关键词[WOS] | OPTICS |
| 收录类别 | ISTP ; SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000228589700024 |
| 公开日期 | 2015-12-24 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/3509]  |
| 专题 | 光电技术研究所_光电技术研究所被WoS收录文章 |
| 作者单位 | 1.Sichuan Univ, Dept Phys, Chengdu 610064, Peoples R China 2.Glasgow Caledonian Univ, Dept Math & Comp Sci, Glasgow G4 0BA, Lanark, Scotland 3.Univ Durham, Dept Phys, Durham DH1 3DJ, England 4.Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China |
| 推荐引用方式 GB/T 7714 | Gao, FH,Cheng, Y,Tang, XG,et al. Fabrication error model and near field beam modulation analysis for phase step diffractive gratings[J]. MICROELECTRONIC ENGINEERING,2005,78-79:142-146. |
| APA | Gao, FH,Cheng, Y,Tang, XG,Yao, J,Qiu, CK,&Guo, YK.(2005).Fabrication error model and near field beam modulation analysis for phase step diffractive gratings.MICROELECTRONIC ENGINEERING,78-79,142-146. |
| MLA | Gao, FH,et al."Fabrication error model and near field beam modulation analysis for phase step diffractive gratings".MICROELECTRONIC ENGINEERING 78-79(2005):142-146. |
入库方式： OAI收割
来源：光电技术研究所
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