中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Variation of the deposition rate during ion beam sputter deposition of optical thin films

文献类型:期刊论文

作者Liu, HX; Xiong, SM; Li, LH; Zhang, YD
刊名THIN SOLID FILMS
出版日期2005-07-22
卷号484期号:1-2页码:170-173
关键词sputtering tantalum oxide optical coatings optical properties
英文摘要Time-power monitoring technique was used for monitoring the thickness of optical films during ion beam sputter deposition. For Ta2O5, in the initial stage of coating, the growth rate increases with deposition time. While for SiO2, the rate increases first and then decreases. Both growth rates eventually stabilize when a proper ratio of atoms are sputtered from target materials. Finally, the mismatch of optical thickness and the inhomogeneity of film layers that affect substantially the optical performance of the samples were discussed. (c) 2005 Elsevier B.V. All rights reserved.
WOS标题词Science & Technology ; Technology ; Physical Sciences
类目[WOS]Materials Science, Multidisciplinary ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter
研究领域[WOS]Materials Science ; Physics
关键词[WOS]OXIDE-FILMS ; TITANIUM ; STRESS
收录类别SCI
语种英语
WOS记录号WOS:000230045900026
公开日期2015-12-24
源URL[http://ir.ioe.ac.cn/handle/181551/3520]  
专题光电技术研究所_光电技术研究所被WoS收录文章
作者单位Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China
推荐引用方式
GB/T 7714
Liu, HX,Xiong, SM,Li, LH,et al. Variation of the deposition rate during ion beam sputter deposition of optical thin films[J]. THIN SOLID FILMS,2005,484(1-2):170-173.
APA Liu, HX,Xiong, SM,Li, LH,&Zhang, YD.(2005).Variation of the deposition rate during ion beam sputter deposition of optical thin films.THIN SOLID FILMS,484(1-2),170-173.
MLA Liu, HX,et al."Variation of the deposition rate during ion beam sputter deposition of optical thin films".THIN SOLID FILMS 484.1-2(2005):170-173.

入库方式: OAI收割

来源:光电技术研究所

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