Variation of the deposition rate during ion beam sputter deposition of optical thin films
文献类型：期刊论文
| 作者 | Liu, HX; Xiong, SM; Li, LH; Zhang, YD |
| 刊名 | THIN SOLID FILMS
 |
| 出版日期 | 2005-07-22 |
| 卷号 | 484期号:1-2页码:170-173 |
| 关键词 | sputtering tantalum oxide optical coatings optical properties |
| 英文摘要 | Time-power monitoring technique was used for monitoring the thickness of optical films during ion beam sputter deposition. For Ta2O5, in the initial stage of coating, the growth rate increases with deposition time. While for SiO2, the rate increases first and then decreases. Both growth rates eventually stabilize when a proper ratio of atoms are sputtered from target materials. Finally, the mismatch of optical thickness and the inhomogeneity of film layers that affect substantially the optical performance of the samples were discussed. (c) 2005 Elsevier B.V. All rights reserved. |
| WOS标题词 | Science & Technology ; Technology ; Physical Sciences |
| 类目[WOS] | Materials Science, Multidisciplinary ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter |
| 研究领域[WOS] | Materials Science ; Physics |
| 关键词[WOS] | OXIDE-FILMS ; TITANIUM ; STRESS |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000230045900026 |
| 公开日期 | 2015-12-24 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/3520]  |
| 专题 | 光电技术研究所_光电技术研究所被WoS收录文章 |
| 作者单位 | Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China |
| 推荐引用方式 GB/T 7714 | Liu, HX,Xiong, SM,Li, LH,et al. Variation of the deposition rate during ion beam sputter deposition of optical thin films[J]. THIN SOLID FILMS,2005,484(1-2):170-173. |
| APA | Liu, HX,Xiong, SM,Li, LH,&Zhang, YD.(2005).Variation of the deposition rate during ion beam sputter deposition of optical thin films.THIN SOLID FILMS,484(1-2),170-173. |
| MLA | Liu, HX,et al."Variation of the deposition rate during ion beam sputter deposition of optical thin films".THIN SOLID FILMS 484.1-2(2005):170-173. |
入库方式： OAI收割
来源：光电技术研究所
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