Simulation of DOE fabrication using DMD-based gray-tone lithography
文献类型：期刊论文
| 作者 | Guo, XW; Du, JL; Guo, YK; Du, CL; Cui, Z; Yao, J |
| 刊名 | MICROELECTRONIC ENGINEERING
 |
| 出版日期 | 2006-04-01 |
| 卷号 | 83期号:4-9页码:1012-1016 |
| 关键词 | digital gray-tone lithography imaging model exposure dose DMD DOE |
| 英文摘要 | Digital-multi-micromirror device (DMD)-based photolithography technique is a promising tool for the fabrication of microstructure. In this paper an imaging model was developed for describing its complicated imaging process, and then the fabrication processes of some typical diffractive optical elements (DOEs) were simulated. The simulated results demonstrate that the DMD-based lithography technique allows to realize a wide variety of microoptical elements, e.g., Dammann grating, Fresnel lens, beam shaping element or refractive micro structures. (c) 2006 Elsevier B.V. All rights reserved. |
| WOS标题词 | Science & Technology ; Technology ; Physical Sciences |
| 类目[WOS] | Engineering, Electrical & Electronic ; Nanoscience & Nanotechnology ; Optics ; Physics, Applied |
| 研究领域[WOS] | Engineering ; Science & Technology - Other Topics ; Optics ; Physics |
| 关键词[WOS] | MASKLESS LITHOGRAPHY ; PROJECTION DISPLAY ; DEVICE |
| 收录类别 | ISTP ; SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000237581900094 |
| 公开日期 | 2015-12-24 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/3546]  |
| 专题 | 光电技术研究所_光电技术研究所被WoS收录文章 |
| 作者单位 | 1.Sichuan Univ, Dept Phys, Chengdu 610064, Peoples R China 2.CAS, Inst Opt & Elect, Chengdu 610209, Peoples R China 3.Rutherford Appleton Lab, Didcot OX11 0QX, Oxon, England 4.Univ Durham, Dept Phys, Durham DL1 3DJ, England |
| 推荐引用方式 GB/T 7714 | Guo, XW,Du, JL,Guo, YK,et al. Simulation of DOE fabrication using DMD-based gray-tone lithography[J]. MICROELECTRONIC ENGINEERING,2006,83(4-9):1012-1016. |
| APA | Guo, XW,Du, JL,Guo, YK,Du, CL,Cui, Z,&Yao, J.(2006).Simulation of DOE fabrication using DMD-based gray-tone lithography.MICROELECTRONIC ENGINEERING,83(4-9),1012-1016. |
| MLA | Guo, XW,et al."Simulation of DOE fabrication using DMD-based gray-tone lithography".MICROELECTRONIC ENGINEERING 83.4-9(2006):1012-1016. |
入库方式： OAI收割
来源：光电技术研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。