中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Simulation of DOE fabrication using DMD-based gray-tone lithography

文献类型:期刊论文

作者Guo, XW; Du, JL; Guo, YK; Du, CL; Cui, Z; Yao, J
刊名MICROELECTRONIC ENGINEERING
出版日期2006-04-01
卷号83期号:4-9页码:1012-1016
关键词digital gray-tone lithography imaging model exposure dose DMD DOE
英文摘要Digital-multi-micromirror device (DMD)-based photolithography technique is a promising tool for the fabrication of microstructure. In this paper an imaging model was developed for describing its complicated imaging process, and then the fabrication processes of some typical diffractive optical elements (DOEs) were simulated. The simulated results demonstrate that the DMD-based lithography technique allows to realize a wide variety of microoptical elements, e.g., Dammann grating, Fresnel lens, beam shaping element or refractive micro structures. (c) 2006 Elsevier B.V. All rights reserved.
WOS标题词Science & Technology ; Technology ; Physical Sciences
类目[WOS]Engineering, Electrical & Electronic ; Nanoscience & Nanotechnology ; Optics ; Physics, Applied
研究领域[WOS]Engineering ; Science & Technology - Other Topics ; Optics ; Physics
关键词[WOS]MASKLESS LITHOGRAPHY ; PROJECTION DISPLAY ; DEVICE
收录类别ISTP ; SCI
语种英语
WOS记录号WOS:000237581900094
公开日期2015-12-24
源URL[http://ir.ioe.ac.cn/handle/181551/3546]  
专题光电技术研究所_光电技术研究所被WoS收录文章
作者单位1.Sichuan Univ, Dept Phys, Chengdu 610064, Peoples R China
2.CAS, Inst Opt & Elect, Chengdu 610209, Peoples R China
3.Rutherford Appleton Lab, Didcot OX11 0QX, Oxon, England
4.Univ Durham, Dept Phys, Durham DL1 3DJ, England
推荐引用方式
GB/T 7714
Guo, XW,Du, JL,Guo, YK,et al. Simulation of DOE fabrication using DMD-based gray-tone lithography[J]. MICROELECTRONIC ENGINEERING,2006,83(4-9):1012-1016.
APA Guo, XW,Du, JL,Guo, YK,Du, CL,Cui, Z,&Yao, J.(2006).Simulation of DOE fabrication using DMD-based gray-tone lithography.MICROELECTRONIC ENGINEERING,83(4-9),1012-1016.
MLA Guo, XW,et al."Simulation of DOE fabrication using DMD-based gray-tone lithography".MICROELECTRONIC ENGINEERING 83.4-9(2006):1012-1016.

入库方式: OAI收割

来源:光电技术研究所

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