中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
首页 机构 成果 学者
  
  1. CAS IR Grid
  2. 光电技术研究所
  3. 中国科学院光电技术研究所
  4. 光电技术研究所被WoS收录文章
Fabrication of nanoimprint stamp using interference lithography

文献类型：期刊论文

作者Chen Xian-Zhong; Li Hai-Ying
刊名CHINESE PHYSICS LETTERS
出版日期2007-10-01
卷号24期号:10页码:2830-2832
英文摘要Interference lithography is used to fabricate a nanoimprint stamp, which is a key step for nanoimprint lithography. A layer of chromium in thickness of about 20 nm is deposited on the newly cleaned fused silica substrate by thermal evaporation, and a layer of positive resist in thickness of 150 nm is spun on the chromium layer. Some patterns, including lines, holes and pillars, are observed on the photoresist Elm by exposing the resist to interference patterns and they are then transferred to the chromium layer by wet etching. Fused silica stamps are fabricated by reactive ion etching with CHF3/O-2 as etchants using the chromium layer as etch mask. An atomic force microscope is used to analyse the pattern transfer in each step. The results show that regular hole patterns of fused silica, with average full width 143 nm at half maximum (FWHM), average hole depth of 76 nm and spacing of 450 nm, have been fabricated. The exposure method is fast, inexpensive and applicable for fabrication of nanoimprint stamps with large areas.
WOS标题词Science & Technology ; Physical Sciences
类目[WOS]Physics, Multidisciplinary
研究领域[WOS]Physics
关键词[WOS]OPTICAL-PROPERTIES
收录类别SCI
语种英语
WOS记录号WOS:000249810900032
公开日期2015-12-24
源URL[http://ir.ioe.ac.cn/handle/181551/3581]  
专题光电技术研究所_光电技术研究所被WoS收录文章
作者单位Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China
推荐引用方式
GB/T 7714		 Chen Xian-Zhong,Li Hai-Ying. Fabrication of nanoimprint stamp using interference lithography[J]. CHINESE PHYSICS LETTERS,2007,24(10):2830-2832.
APA Chen Xian-Zhong,&Li Hai-Ying.(2007).Fabrication of nanoimprint stamp using interference lithography.CHINESE PHYSICS LETTERS,24(10),2830-2832.
MLA Chen Xian-Zhong,et al."Fabrication of nanoimprint stamp using interference lithography".CHINESE PHYSICS LETTERS 24.10(2007):2830-2832.

入库方式： OAI收割

来源：光电技术研究所

浏览0
下载0
收藏0
其他版本

除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。