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Sub-diffraction-limited interference photolithography with metamaterials
文献类型：期刊论文
| 作者 | Xu, Ting; Zhao, Yanhui; Ma, Junxian; Wang, Changtao; Cui, Jianhua; Du, Chunlei; Luo, Xiangang |
| 刊名 | OPTICS EXPRESS
 |
| 出版日期 | 2008-09-01 |
| 卷号 | 16期号:18页码:13579-13584 |
| 英文摘要 | We present that an interference lithography technique beyond the diffraction limit can be theoretically achieved by positing an anisotropic metamaterial under the conventional lithographic mask. Based on the special dispersion characteristics of the metamaterial, only the enhanced evanescent waves with high spatial frequencies can transmit through the metamaterial and contribute to the lithography process. Rigorous coupled wave analysis shows that with 442nm exposure light, one-dimensional periodical structures with 40nm features can be patterned. This technique provides an alternative method to fabricate large-area nanostructures. (c) 2008 Optical Society of America. |
| WOS标题词 | Science & Technology ; Physical Sciences |
| 类目[WOS] | Optics |
| 研究领域[WOS] | Optics |
| 关键词[WOS] | LITHOGRAPHY ; REFRACTION ; RESOLUTION |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000259270600011 |
| 公开日期 | 2015-12-24 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/3601]  |
| 专题 | 光电技术研究所_光电技术研究所被WoS收录文章 |
| 作者单位 | Chinese Acad Sci, State Key Lab Opt Technol Microfabricat, Inst Opt & Elect, Chengdu 610209, Peoples R China |
| 推荐引用方式 GB/T 7714 | Xu, Ting,Zhao, Yanhui,Ma, Junxian,et al. Sub-diffraction-limited interference photolithography with metamaterials[J]. OPTICS EXPRESS,2008,16(18):13579-13584. |
| APA | Xu, Ting.,Zhao, Yanhui.,Ma, Junxian.,Wang, Changtao.,Cui, Jianhua.,...&Luo, Xiangang.(2008).Sub-diffraction-limited interference photolithography with metamaterials.OPTICS EXPRESS,16(18),13579-13584. |
| MLA | Xu, Ting,et al."Sub-diffraction-limited interference photolithography with metamaterials".OPTICS EXPRESS 16.18(2008):13579-13584. |
入库方式： OAI收割
来源：光电技术研究所
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