RET simulations for SLM-based maskless lithography
文献类型：期刊论文
| 作者 | Guo, XlaoWei1,2; Du, Jinglei2; Luo, Xiangang3; Deng, Qiling3; Du, Chunlei3 |
| 刊名 | MICROELECTRONIC ENGINEERING
 |
| 出版日期 | 2008-05-01 |
| 卷号 | 85期号:5-6页码:929-933 |
| 关键词 | optical maskless lithography spatial light modulator reticle enhancement technique |
| 英文摘要 | In this paper, we have preformed some simulations of reticle enhancement techniques (RET) for SLM-based maskless lithography. Our results show that, on the one hand, increased slope and larger process window can be simultaneously obtained by overtilting some mirrors around the printed structure; On the other hand, fully making use of the grayscaling generated by tilting a mirror across it, a maskless tool can use the same OPC model as a mask-based scanner, such as gray level serifs, sub-resolution scatter bars, transmittance controlled mask, and so on. The results also imply that optical maskless lithography (OML) provides the ability in attaining high resolution comparable to the mask-based lithography. (c) 2008 Elsevier B.V. All rights reserved. |
| WOS标题词 | Science & Technology ; Technology ; Physical Sciences |
| 类目[WOS] | Engineering, Electrical & Electronic ; Nanoscience & Nanotechnology ; Optics ; Physics, Applied |
| 研究领域[WOS] | Engineering ; Science & Technology - Other Topics ; Optics ; Physics |
| 关键词[WOS] | OPTICAL PROXIMITY CORRECTION ; DESIGN ; MICROLITHOGRAPHY ; FABRICATION |
| 收录类别 | SCI ; ISTP |
| 语种 | 英语 |
| WOS记录号 | WOS:000257413400048 |
| 公开日期 | 2015-12-24 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/3603]  |
| 专题 | 光电技术研究所_光电技术研究所被WoS收录文章 |
| 作者单位 | 1.Univ Elect Sci & Technol China, Sch Optoelect Informat, Chengdu 610054, Peoples R China 2.Sichuan Univ, Dept Phys, Chengdu 610064, Peoples R China 3.CAS, Inst Opt & Elect, Chengdu 610209, Peoples R China |
| 推荐引用方式 GB/T 7714 | Guo, XlaoWei,Du, Jinglei,Luo, Xiangang,et al. RET simulations for SLM-based maskless lithography[J]. MICROELECTRONIC ENGINEERING,2008,85(5-6):929-933. |
| APA | Guo, XlaoWei,Du, Jinglei,Luo, Xiangang,Deng, Qiling,&Du, Chunlei.(2008).RET simulations for SLM-based maskless lithography.MICROELECTRONIC ENGINEERING,85(5-6),929-933. |
| MLA | Guo, XlaoWei,et al."RET simulations for SLM-based maskless lithography".MICROELECTRONIC ENGINEERING 85.5-6(2008):929-933. |
入库方式： OAI收割
来源：光电技术研究所
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