Spectrum-Integral Talbot Effect for UV Photolithography With Extended DOF
文献类型：期刊论文
| 作者 | Liu, Junbo1,2; Zhou, Shaolin3; Hu, Song4; Gao, Hongtao4; He, Yu4; Cheng, Yiguang1,2
|
| 刊名 | IEEE PHOTONICS TECHNOLOGY LETTERS
 |
| 出版日期 | 2015-10-15 |
| 卷号 | 27期号:20页码:2201-2204 |
| 关键词 | Diffraction depth-of-focus Talbot lithography microfabrication |
| ISSN号 | 1041-1135 |
| 英文摘要 | A route of spectrum-integral Talbot lithography (SITL) with extended depth-of-focus (DOF) for microfabrication of periodic structures was explored under broadband incoherent illumination in this letter. The transmitted diffraction fields by different spectral components integrate together to generate the successive periodicity since certain distance along the direction of propagation. The mechanism of DOF extension was derived and numerically elucidated using the spectrum of a practical ultraviolet source. Experiments of proximity lithography in term of the numeric results were performed to record the intensity distributions within the DOF area. Finally, the results reveal the validity of SITL and its potentials in high-fidelity lithography of periodic micropatterns with almost unlimited DOF and thus enhanced resolution. |
| WOS标题词 | Science & Technology ; Technology ; Physical Sciences |
| 类目[WOS] | Engineering, Electrical & Electronic ; Optics ; Physics, Applied |
| 研究领域[WOS] | Engineering ; Optics ; Physics |
| 关键词[WOS] | INTERFERENCE LITHOGRAPHY ; HIGH-RESOLUTION ; GRATINGS ; ARRAYS |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000361685200024 |
| 公开日期 | 2015-12-24 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/3710]  |
| 专题 | 光电技术研究所_光电技术研究所被WoS收录文章 |
| 作者单位 | 1.Univ Chinese Acad Sci, Beijing 100049, Peoples R China 2.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China 3.S China Univ Technol, Sch Elect & Informat Engn, Guangzhou 510640, Guangdong, Peoples R China 4.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China |
| 推荐引用方式 GB/T 7714 | Liu, Junbo,Zhou, Shaolin,Hu, Song,et al. Spectrum-Integral Talbot Effect for UV Photolithography With Extended DOF[J]. IEEE PHOTONICS TECHNOLOGY LETTERS,2015,27(20):2201-2204. |
| APA | Liu, Junbo,Zhou, Shaolin,Hu, Song,Gao, Hongtao,He, Yu,&Cheng, Yiguang.(2015).Spectrum-Integral Talbot Effect for UV Photolithography With Extended DOF.IEEE PHOTONICS TECHNOLOGY LETTERS,27(20),2201-2204. |
| MLA | Liu, Junbo,et al."Spectrum-Integral Talbot Effect for UV Photolithography With Extended DOF".IEEE PHOTONICS TECHNOLOGY LETTERS 27.20(2015):2201-2204. |
入库方式： OAI收割
来源：光电技术研究所
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