中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Spectrum-Integral Talbot Effect for UV Photolithography With Extended DOF

文献类型:期刊论文

作者Liu, Junbo1,2; Zhou, Shaolin3; Hu, Song4; Gao, Hongtao4; He, Yu4; Cheng, Yiguang1,2
刊名IEEE PHOTONICS TECHNOLOGY LETTERS
出版日期2015-10-15
卷号27期号:20页码:2201-2204
关键词Diffraction depth-of-focus Talbot lithography microfabrication
ISSN号1041-1135
英文摘要A route of spectrum-integral Talbot lithography (SITL) with extended depth-of-focus (DOF) for microfabrication of periodic structures was explored under broadband incoherent illumination in this letter. The transmitted diffraction fields by different spectral components integrate together to generate the successive periodicity since certain distance along the direction of propagation. The mechanism of DOF extension was derived and numerically elucidated using the spectrum of a practical ultraviolet source. Experiments of proximity lithography in term of the numeric results were performed to record the intensity distributions within the DOF area. Finally, the results reveal the validity of SITL and its potentials in high-fidelity lithography of periodic micropatterns with almost unlimited DOF and thus enhanced resolution.
WOS标题词Science & Technology ; Technology ; Physical Sciences
类目[WOS]Engineering, Electrical & Electronic ; Optics ; Physics, Applied
研究领域[WOS]Engineering ; Optics ; Physics
关键词[WOS]INTERFERENCE LITHOGRAPHY ; HIGH-RESOLUTION ; GRATINGS ; ARRAYS
收录类别SCI
语种英语
WOS记录号WOS:000361685200024
公开日期2015-12-24
源URL[http://ir.ioe.ac.cn/handle/181551/3710]  
专题光电技术研究所_光电技术研究所被WoS收录文章
作者单位1.Univ Chinese Acad Sci, Beijing 100049, Peoples R China
2.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China
3.S China Univ Technol, Sch Elect & Informat Engn, Guangzhou 510640, Guangdong, Peoples R China
4.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China
推荐引用方式
GB/T 7714
Liu, Junbo,Zhou, Shaolin,Hu, Song,et al. Spectrum-Integral Talbot Effect for UV Photolithography With Extended DOF[J]. IEEE PHOTONICS TECHNOLOGY LETTERS,2015,27(20):2201-2204.
APA Liu, Junbo,Zhou, Shaolin,Hu, Song,Gao, Hongtao,He, Yu,&Cheng, Yiguang.(2015).Spectrum-Integral Talbot Effect for UV Photolithography With Extended DOF.IEEE PHOTONICS TECHNOLOGY LETTERS,27(20),2201-2204.
MLA Liu, Junbo,et al."Spectrum-Integral Talbot Effect for UV Photolithography With Extended DOF".IEEE PHOTONICS TECHNOLOGY LETTERS 27.20(2015):2201-2204.

入库方式: OAI收割

来源:光电技术研究所

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